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Proceedings Paper

Study of photoresist pregrooved structures
Author(s): Changjiu Jiang; Weidong Yang; Lijuan Wang; Dawen Wang; Chunli Bai
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Paper Abstract

Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.

Paper Details

Date Published: 13 August 1993
PDF: 4 pages
Proc. SPIE 2053, Optical Storage (ISOS '92), (13 August 1993); doi: 10.1117/12.150656
Show Author Affiliations
Changjiu Jiang, Shanghai Institute of Metallurgy (China)
Weidong Yang, Shanghai Institute of Metallurgy (China)
Lijuan Wang, Shanghai Institute of Metallurgy (China)
Dawen Wang, Institute of Chemistry (China)
Chunli Bai, Institute of Chemistry (China)

Published in SPIE Proceedings Vol. 2053:
Optical Storage (ISOS '92)
Fuxi Gan, Editor(s)

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