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Proceedings Paper

Improvement of the physical-optics approximation for topography simulation in optical lithography
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Paper Abstract

This paper discusses various techniques to implement the physical-optics approximation for topography simulation. The accuracies of the various techniques are examined by comparison with the results of a rigorous, time- domain method. It is shown that inter-surface multiple scattering effects and near-field diffraction effects in intra-surface multiple scattering must both be taken into account to obtain satisfactory agreement with the time-domain method. A technique to correct for the effects of non-physical-optics edge currents is also described.

Paper Details

Date Published: 8 August 1993
PDF: 14 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150480
Show Author Affiliations
Michael S. Yeung, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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