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Proceedings Paper

Rim phase-shift mask combined with off-axis illumination: a path to .5lambda/NA geometries
Author(s): Timothy A. Brunner
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Paper Abstract

Phase Shift Mask (PSM) approaches may be classified as either strong or weak. This paper addresses weak PSM approaches which are attractive because of their universal applicability to any pattern. A simple design algorithm for rim PSM, called Biased Rim Design (BiRD), is described. When used with normal stepper illumination ((sigma) equals .5), the modest benefits of rim PSM are of questionable value in many cases. However, theoretical considerations show a synergy of weak PSM combined with off-axis illumination. One specific combination termed BiRD/QUEST, is explored through a series of simulations. These results suggest that a properly biased weak PSM with appropriate illumination allows robust manufacturing of 0.5 (lambda) /NA lithographic patterns.

Paper Details

Date Published: 8 August 1993
PDF: 9 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993);
Show Author Affiliations
Timothy A. Brunner, IBM Thomas J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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