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Proceedings Paper

Chromeless phase-shift technology: the physical mechanism of the dark area produced by phase compensation and its application
Author(s): Long Que; Guoliang Sun; Boru Feng
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Paper Abstract

In the study of phase-shift mask technology, we found a peculiar phenomenon: on certain conditions, phase-shift mask behaves like an opaque area (dark area). In order to know the reason, we discuss and analyze the mechanism of the phenomenon in detail, using diffraction theory and information theory. Also we found that there exists a critical value of the non- phase-shift area's dimension, as long as we are below the value, we can make a phase-shift mask be a dark area, no matter what kind of shape the mask has. In the meantime, the applications of the phenomenon are also suggested.

Paper Details

Date Published: 8 August 1993
PDF: 6 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150464
Show Author Affiliations
Long Que, Institute of Optics and Electronics (China)
Guoliang Sun, Institute of Optics and Electronics (China)
Boru Feng, Institute of Optics and Electronics (China)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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