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Proceedings Paper

Vector aerial image with off-axis illumination
Author(s): Eytan Barouch; Daniel C. Cole; Uwe Hollerbach; Steven A. Orszag
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Paper Abstract

As the numerical aperture (NA) in optical projection systems increases, the vector nature of the projected electric and magnetic fields becomes more important. Recent advances in off- axis illumination, tilting condenser lenses, and applying spatial filters, as well as phase-shift masks, hold the potential of increased depth of focus. To simulate these techniques in the high- NA regime, we have developed new fast algorithms. The development reported here builds on our recent work (1) extending scalar aerial imaging. The systematic treatment of (1) has now been applied to account for the vector nature of light.

Paper Details

Date Published: 8 August 1993
PDF: 23 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150463
Show Author Affiliations
Eytan Barouch, Princeton Univ. (United States)
Daniel C. Cole, IBM Corp. (United States)
Uwe Hollerbach, Princeton Univ. (United States)
Steven A. Orszag, Princeton Univ. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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