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Proceedings Paper

Subhalf-micron stepper with a reticle particle monitor
Author(s): Michio Kohno; Nobuhiro Kodachi; Kazumi Yajima; Seiya Miura
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Paper Abstract

We developed subhalf micron steppers, the FPA-2500i2 and the FPA-2500i3 (abbreviated here as i2 and i3, respectively), suitable to 16 M and 64 M DRAM processes. These new steppers incorporate high sensitivity reticle particle monitors (RPM) in order to increase chip yield. In this report, first the steppers' basic performance is demonstrated. Secondly, the printability of particles and its influence on circuit patterns are quantified by simulations and experiments. Thirdly, the RPM's detection principle is discussed theoretically, and finally the experimental results are shown.

Paper Details

Date Published: 8 August 1993
PDF: 14 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150453
Show Author Affiliations
Michio Kohno, Canon, Inc. (Japan)
Nobuhiro Kodachi, Canon, Inc. (Japan)
Kazumi Yajima, Canon, Inc. (Japan)
Seiya Miura, Canon, Inc. (Japan)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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