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Proceedings Paper

Three-dimensional resist profile simulation
Author(s): Masaya Komatsu
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Paper Abstract

A new 3-dimensional (3-D) resist profile simulator has been developed. The energy distribution in the photoresist is calculated by Yeung's vector model in order to take into account the effects caused by oblique propagation of the light, which cannot be neglected because of high numerical aperture (NA) of the projection lens. A new algorithm for the development process is proposed to overcome the inconveniences of conventional models. A new differential equation which we call `Profile Equation' is derived and solved numerically to give the final resist profile. This model has been found to give practically the same results as those obtained by using string model in the 2-D case and can easily be applied to the 3-D case.

Paper Details

Date Published: 8 August 1993
PDF: 14 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150440
Show Author Affiliations
Masaya Komatsu, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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