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Proceedings Paper

New ring array off-axis illumination system for subhalf-micron lithography
Author(s): Haixing Zou; Qihua Yan; Yu Yan
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Paper Abstract

We have studied a new model excimer laser illumination system used in sub-half-micron lithography to improve optical lithography resolution. This system consists of a KrF excimer laser, laser beam expander, axicon-lens, ring-array-lens, aperture stop and field lenses. In the system, an expanded excimer laser beam is focused on a ring which is in the focus of the axicon-lens. The ring-array-lens situated at the ring beam is used as a laser beam uniformizer. And finally, the ring beam is imaged on the aperture stop of the projective lens by field lenses. This is a special off-axis illumination system. The image distribution of mask pattern on the wafer become sharper than that of general illumination systems. Eighty percent of excimer laser energy can be used in an exposure wafer without energy loss in the projective lens. On the mask, the uniformity of illumination obtained is less than 2 percent and the system can be used in 150 nm - 300 nm deep UV region optical lithography.

Paper Details

Date Published: 8 August 1993
PDF: 4 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150428
Show Author Affiliations
Haixing Zou, Shanghai Institute of Optics and Fine Mechanics (China)
Qihua Yan, Shanghai Institute of Optics and Fine Mechanics (China)
Yu Yan, Shanghai Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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