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Proceedings Paper

Optimization of the spatial properties of illumination for improved lithographic response
Author(s): Chris A. Mack
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Paper Abstract

Using computer simulations of the lithographic process, the effects of illuminator modifications are studied. Both symmetric (e.g., annular) and asymmetric (e.g., quadrupole) illumination are discussed and annular illumination is examined in detail. The most significant trade-off in the use of these illuminators is that by optimizing the illumination for one feature size and type, other features may be degraded. Mask linearity also worsens and ceases to be a reliable metric for lithographic quality. The benefit is improved depth-of-focus at the feature size for which the illumination was optimized. These trade-offs are studied in detail and general recommendations for a design approach for the use of different illumination schemes are made.

Paper Details

Date Published: 8 August 1993
PDF: 12 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150418
Show Author Affiliations
Chris A. Mack, FINLE Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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