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Proceedings Paper

Understanding, quantifying, and reducing photospeed test error through technical partnerships and experimental design
Author(s): Mark A. Wirzbicki; James S. Lekas; Jesus F. Cuellar; Charlie L. Paddock; Mark A. Seliger; Michael W. Stan
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Paper Abstract

Technical requirements for advanced manufacturing processes require strict photoresist photospeed control. To meet this need, it is necessary to determine the error associated with measuring photospeed at both the photoresist supplier and user Fabs. This paper described two studies targeted at determining and improving the photospeed test error at both the supplier and user Fabs. The initial work focused on understanding each company's test methodologies, respective capabilities and sources of variation. This consisted of a 48-hour photospeed repeatability test during which process and environmental conditions were monitored. Through brainstorming and the results of the repeatability study, factors affecting the signal-to-noise were identified and evaluated in a designed experiment.

Paper Details

Date Published: 4 August 1993
PDF: 10 pages
Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.149005
Show Author Affiliations
Mark A. Wirzbicki, Shipley Co. Inc. (United States)
James S. Lekas, Digital Equipment Corp. (United States)
Jesus F. Cuellar, Digital Equipment Corp. (United States)
Charlie L. Paddock, Shipley Co. Inc. (United States)
Mark A. Seliger, Digital Equipment Corp. (United States)
Michael W. Stan, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 1926:
Integrated Circuit Metrology, Inspection, and Process Control VII
Michael T. Postek, Editor(s)

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