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Proceedings Paper

Precise reticle defect classification and sizing based on double-tier inspection technique
Author(s): Yair Eran; Shiree Shafrir; Ido Weinberg; Nissim Almaliach; Meir Aloni; Saeed Sabouri
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Paper Abstract

A new scheme for automatic defect classification and sizing is presented. The new scheme is developed for improving the overall production of automatic die-to-database reticle inspection equipment for defect detection. The new scheme replaces the time-consuming, inaccurate and non-repeatable traditional methods that are based on human reviewing and verification of defects with the aid of relatively crude image processing electronics. In order to overcome these limitations, a double-tier scheme has been developed for automatic defect classification and sizing (ADCS). The fundamentals of this scheme are presented. The image processing algorithms are described and their overall performance is evaluated using various test and production masks. The reported scheme represents a practical precise and accurate method for automatic classification and sizing.

Paper Details

Date Published: 4 August 1993
PDF: 12 pages
Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148993
Show Author Affiliations
Yair Eran, Orbot Instruments Ltd. (Israel)
Shiree Shafrir, Orbot Instruments Ltd. (Israel)
Ido Weinberg, Orbot Instruments Ltd. (Israel)
Nissim Almaliach, Orbot Instruments Ltd. (Israel)
Meir Aloni, Orbot Instruments Ltd. (Israel)
Saeed Sabouri, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 1926:
Integrated Circuit Metrology, Inspection, and Process Control VII
Michael T. Postek, Editor(s)

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