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Proceedings Paper

Nonlinear transmittance through laser protection barrier: reverse photosaturation of 1-phenylazo 2-napthalenol in polymer host
Author(s): Michael W. Mayo; William P. Roach; Craig M. Bramlette; M. D. Gavornik
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Paper Abstract

We have measured the time-dependent transmittance of 'orange plastic' samples composed of the dye 1-Phenylazo 2-Napthalenol embedded in both polymethyl methacrylate (PMMA) and polycarbonate at various dye concentrations. The spectrophotometric transmittance below 520 nm is measured to be less than 0.01% for the PMMA samples. However, a 6.4 mm thick PMMA sample containing 0.008% dye concentration reached a steady-state transmittance of 0.5% in 15 seconds for samples irradiated with continuous wave 514.5 nm light at 12 mW/cm2. The transmittance reached a steady-state of 11% in 2.5 seconds when irradiated with 514.5 nm at greater than 600 W/cm2 incident. This represents a three order of magnitude increase in the transmittance at relatively low irradiance levels. In contrast, a 6.4 nm thick PMMA sample containing a dye concentration of 0.03% continued to transmit less than 0.01% with increased irradiance until the material reached damage threshold. We report ground-state absorption curves and transmittance versus time measurements for dye concentrations ranging from 0.008% to 0.15% in PMMA and polycarbonate. We compared the steady-state transmittance at 514.5 nm to the incident irradiance. We propose possible mechanisms associated with the nonlinear transmittance characteristics of 1-Phenylazo 2-Napthalenol.

Paper Details

Date Published: 17 June 1993
PDF: 10 pages
Proc. SPIE 1864, Solid State Lasers IV, (17 June 1993); doi: 10.1117/12.146892
Show Author Affiliations
Michael W. Mayo, Air Force Armstrong Lab. (United States)
William P. Roach, Air Force Armstrong Lab. (United States)
Craig M. Bramlette, Air Force Armstrong Lab. (United States)
M. D. Gavornik, Air Force Office of Scientific Research (United States)

Published in SPIE Proceedings Vol. 1864:
Solid State Lasers IV
Gregory J. Quarles; Milton A. Woodall II, Editor(s)

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