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Proceedings Paper

Generation and amplification of subpicosecond ArF radiation
Author(s): Thomas Hofmann; Kasem Mossavi; Gabor Szabo; Frank K. Tittel
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Paper Abstract

A dispersively compensated scheme for sum-frequency mixing has been developed to generate subpicosecond injection pulses at 193 nm for subsequent amplification in ArF excimer amplifier modules. Such a scheme is capable of generating 12 (mu) J at 193 nm with a spectral bandwidth of 0.22 nm corresponding to 250 fs pulse duration by mixing short pulse radiation at 266 nm and 707 nm in a 1 mm BBO crystal. This VUV source has been used to characterize the small-signal gain and the saturation energy density of a discharge pumped ArF excimer amplifier.

Paper Details

Date Published: 4 May 1993
PDF: 5 pages
Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); doi: 10.1117/12.144673
Show Author Affiliations
Thomas Hofmann, Rice Univ. (United States)
Kasem Mossavi, Rice Univ. (Germany)
Gabor Szabo, Jate Univ. (Hungary)
Frank K. Tittel, Rice Univ. (United States)

Published in SPIE Proceedings Vol. 1810:
9th International Symposium on Gas Flow and Chemical Lasers
Costas Fotakis; Costas Kalpouzos; Theodore G. Papazoglou, Editor(s)

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