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Proceedings Paper

Efficiency of pulsed-discharge-initiated HF chemical lasers
Author(s): D. Chuchem; M. Amit
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Paper Abstract

In the pulsed HF chemical laser the reactants, typically SF6 and H2 diluted in He, are premixed in the laser cavity. The laser pumping reaction, F + H2 yields HF* + H, occurs following the production of free neutral F atoms from the SF6 host molecule. One method commonly employed in `cracking' the F atom host molecule is dissociative electron attachment during pulsed electrical discharge. Typically, this pulsed discharge is produced when a low-inductance storage capacitor, C1, is charged to high voltage, and discharged through a two electrode gap in the laser cavity with a low-inductance circuit. The introduction of a high-voltage switch into this circuit is necessary because the laser gap threshold breakdown voltage is usually too low to achieve appreciable efficiency. The efficiency of this process is improved by introducing an intermediate capacitor, C2, into the circuit. Generally this efficiency improvement is explained by the observation that the C2-laser circuit has a much lower inductance than the C1-laser circuit because the C1-laser circuit must include a high-voltage switch. Thus, in this capacity, C2 is called a `speed-up' capacitor. In this paper we present data to show that for voltages above the discharge threshold region, and various C1/C2 ratios, there is a direct correlation between laser output energy, and the energy transferred to the C2 capacitor.

Paper Details

Date Published: 4 May 1993
PDF: 4 pages
Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); doi: 10.1117/12.144652
Show Author Affiliations
D. Chuchem, Nuclear Research Ctr./Negev (Israel)
M. Amit, Nuclear Research Ctr./Negev (Israel)

Published in SPIE Proceedings Vol. 1810:
9th International Symposium on Gas Flow and Chemical Lasers
Costas Fotakis; Costas Kalpouzos; Theodore G. Papazoglou, Editor(s)

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