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Proceedings Paper

Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China
Author(s): Liying Han; Jiancun Gao; Jianchen Wang
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Paper Abstract

Various optical thin films of metal oxides and ITO have been deposited by low voltage reactive ion plating technique. Analysis of the resulting thin films shows that their microstructures are evidently improved.

Paper Details

Date Published: 11 May 1993
PDF: 4 pages
Proc. SPIE 1979, 1992 International Conference on Lasers and Optoelectronics, (11 May 1993); doi: 10.1117/12.144124
Show Author Affiliations
Liying Han, Tsinghua Univ. (China)
Jiancun Gao, Tsinghua Univ. (China)
Jianchen Wang, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 1979:
1992 International Conference on Lasers and Optoelectronics
Sui-Sheng Mei; Bingkun Zhou, Editor(s)

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