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Proceedings Paper

Implications of 64-MB reticle specifications on metrology tool requirements
Author(s): Bert F. Plambeck; Scott Landstrom; Barry Rockwell
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Paper Abstract

The forecasted specifications for 64 meg 5X reticles dramatically reduce the allowable range for CD accuracy and imprecision. These 1992/93 5X reticle CD requirements will demand not only that the photomask supplier manufacture reticles to uniformity requirements unheard of only last year, but also measure them with enough precision to avoid yield loss caused by measurement imprecision. Of fundamental importance is how yield loss is caused and affected by measurement sample size, process capability, measurement specifications, and the magnitude of measurement tool imprecision. This paper describes a cost model developed for metrology tools. The model uses standard formulations of Cp, precision to tolerance ratios (P/T), and measurement tool imprecision to forecast yield loss based on measurement sample size and reticle specifications. The model gives a close look at Cp distortion caused by measurement tool imprecision and what Cp distortion's impact on manufacturing cost is. A `typical' manufacturing environment is modeled and a cost analysis done.

Paper Details

Date Published: 26 March 1993
PDF: 12 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142154
Show Author Affiliations
Bert F. Plambeck, SiScan Systems, Inc. (United States)
Scott Landstrom, SiScan Systems, Inc. (United States)
Barry Rockwell, Photronics, Inc. (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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