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Proceedings Paper

Rational argument for the impracticability of 1x reticles
Author(s): Gerry Owen; Roger Fabian W. Pease; Nadim I. Maluf; Robert L. Hsieh; Jun Ye; C. Neil Berglund
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Paper Abstract

Even at 0.5 micrometers design rules, the specifications on 5X reticles are set extremely tightly, on the grounds that ULSI patterns are so complex that tight specifications are essential to obtain acceptable yield. It is usually assumed that these specifications scale with the design rules, and that they should be even tighter for 1X reticles. As a consequence, it has been argued that 1X reticles for 0.25 micrometers design rules are impracticable. A statistical analysis, starting from first principles, and assuming point independent, normally distributed errors, supports the way in which mask specifications are currently set. The assumptions of spatial invariance and normal distribution are crucially important in the analysis. However, it is far from clear that they are valid. Consequently, mask specifications in general, as they are currently set, may be unnecessarily severe.

Paper Details

Date Published: 26 March 1993
PDF: 10 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142149
Show Author Affiliations
Gerry Owen, Hewlett-Packard Co. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)
Nadim I. Maluf, Stanford Univ. (United States)
Robert L. Hsieh, Stanford Univ. (United States)
Jun Ye, Stanford Univ. (United States)
C. Neil Berglund, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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