Share Email Print

Proceedings Paper

Simple method for rim shifter design: the biased self-aligned rim shifter
Author(s): Chris A. Mack
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A new, simple approach is given for the design of phase shifting masks using self-aligned rim shifters. First, a series of design curves are generated, which show all the combinations of rim width and chrome width which print a certain feature for a given process. Second, based on performance criteria for the critical feature(s) on the mask, a rim width is chosen. Finally, the design curves are used with the desired rim width to generate a bias rule which determines the needed chrome mask bias as a function of feature size and type. The result is an easy-to- fabricate self-aligned rim shifter mask with nearly the same performance benefits of a complicated two-level sized rim shifter mask. This technique is called the Biased Self-Aligned Rim Shifter.

Paper Details

Date Published: 26 March 1993
PDF: 8 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142144
Show Author Affiliations
Chris A. Mack, FINLE Technologies (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?