Proceedings Paper
Status of x-ray mask inspection and repair| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
The status of x-ray mask inspection and repair at the IBM Advanced Mask Facility is presented. Defect classification and sources are presented along with some preliminary results from a defect printing study done at the Advanced Lithography Facility.
Paper Details
Date Published: 26 March 1993
PDF: 11 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142140
Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)
PDF: 11 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142140
Show Author Affiliations
Steven C. Nash, IBM Federal Systems Co. (United States)
James P. Levin, IBM Federal Systems Co. (United States)
James P. Levin, IBM Federal Systems Co. (United States)
O. De Hodgins, IBM Federal Systems Co. (United States)
Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)
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