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Proceedings Paper

Status and trends of laser mask-repair technologies
Author(s): James K. Tison; John M. O'Connor
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Paper Abstract

In the past several months attention has been focused on improving the chrome repair technology, an equally important consideration for future photomask applications. In this paper a new Nd:YAG laser configuration is described. Chrome machining characteristics of the Nd:YAG laser are discussed in terms of the cut-to-cut dimensional stability and the substrate surface quality after repair. Semi-automated stage motion and positioning techniques have been developed to take full advantage of the improved reproducibility of the Nd:YAG laser. It is shown that repair quality has been significantly improved over the full range of repair dimensions compared with the Nd:YAG laser configuration currently employed in laser mask repair tools. In conclusion, the implications of these improvements for future mask applications, including phase-shifting masks, are discussed.

Paper Details

Date Published: 26 March 1993
PDF: 5 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142138
Show Author Affiliations
James K. Tison, Quantronix Corp. (United States)
John M. O'Connor, Quantronix Corp. (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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