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Proceedings Paper

Point-of-use laser inspection
Author(s): Mimi L. Koehler
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Paper Abstract

The use of post-pelliclization inspection is a step toward zero customer return, due to particles on the mask under the pellicle. Implementation of a laser inspection system in wafer fabs allows mask users with the ability to (1) check the quality of incoming masks for shipping related defects, (2) perform on-going reliability checks to reduce mask defect related yield losses, and (3) reduce handling by reducing manual inspection. This paper describes the techniques used in the calibration of the laser inspection system, QC Optics API-3000, and several benefits from this inspection. In addition to calibration, monitoring system performance is critical to the success of this inspection. Types of monitor masks are described here, including methods of generation and uses of monitor masks.

Paper Details

Date Published: 26 March 1993
PDF: 10 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142135
Show Author Affiliations
Mimi L. Koehler, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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