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Proceedings Paper

Printability of particles on 5x reticles
Author(s): Robert W. Murphy; David S. Flesberg; Terrence W.O. Reilly; James A. Reynolds
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Paper Abstract

Significant effort is expended at photomask facilities to achieve particle-free reticles prior to pelliclization. The smaller the specified particle size, the more difficult this task becomes. Laser scanning equipment is now available which can locate particles in the pellicle cavity down to a specified 0.5 micrometers . Some optical techniques are more sensitive but less repeatable. Pixel scanning systems can find even smaller particles. In this study two test reticles, one with programmed defects in relatively large geometries and one with programmed defects in highly periodic structures were contaminated with poly styrene latex (PSL) spheres in sizes from 0.5 micrometers to 4 micrometers . The reticles were characterized and printed onto wafers to determine the printability of the spheres compared to programmed chrome defects with the same size and situation. The smallest PSL sphere which printed was 0.7 micrometers and it occurred in periodic structures of 0.8 micrometers .

Paper Details

Date Published: 26 March 1993
PDF: 12 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142134
Show Author Affiliations
Robert W. Murphy, Apex Lithography Services, Inc. (United States)
David S. Flesberg, Hoya Micro Mask (United States)
Terrence W.O. Reilly, Hitachi Scientific Instruments (United States)
James A. Reynolds, Reynolds Consulting (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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