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Proceedings Paper

Coherence probe metrology for phase-shift masks: initial results
Author(s): Mark Allen Neil; Robert J. Monteverde; Stephen D. Kirkish
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Paper Abstract

Coherence probe metrology (CPM) is a unique optical imaging technology which allows non- contact three dimensional measurements of sub-micron features. This technology has been applied to CD and overlay metrology on semiconductor wafers. CPM technology employs a Linnik interferometer to collect 3-D information, measuring both the amplitude and phase of an image. This makes CPM a promising technology for phase shift mask metrology. This paper gives a technical description covering the theory of the coherence probe microscope. Cross-sectional CPM images of phase shift mask features are presented, showing the ability to image quartz and PMMA shifter structures. Initial metrology performances for feature width and shifter thickness are presented. Linearity of CD is examined. Results are shown for shifter only and rim shifter masks. Shifter thickness measurement precision is compared for envelope-only and phase based signal measurement algorithms.

Paper Details

Date Published: 26 March 1993
PDF: 8 pages
Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142131
Show Author Affiliations
Mark Allen Neil, KLA Instruments Corp. (United States)
Robert J. Monteverde, KLA Instruments Corp. (United States)
Stephen D. Kirkish, KLA Instruments Corp. (United States)

Published in SPIE Proceedings Vol. 1809:
12th Annual BACUS Symposium on Photomask Technology and Management
Scott Landstrom; Richard LaFrance, Editor(s)

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