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Proceedings Paper

Forming of 'contact window' submicron topological structure by laser vacuum lithography
Author(s): Anatoly I. Sharendo; Victor V. Boksha; Eduard I. Tochitsky; Vyjacheslav E. Obukhov
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Paper Abstract

This paper offers the results of investigations of forming the submicron topological structures of the 'contact window'-type by using only all-dry vacuum and plasmas technologies. A technological process of manufacturing a three-layer structure 'metal-dielectric-metal' by using the LVPL is developed to study electrical characteristic of systems with micron and submicron contact windows. The contact resistance versus contact window dimensions obtained with the aid of such structures is the inverse square dependence which correlates well with the calculated one. Analysis is made of the relationship between lithographic and electric parameters of contact systems with micron-size features.

Paper Details

Date Published: 16 March 1993
PDF: 7 pages
Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); doi: 10.1117/12.142082
Show Author Affiliations
Anatoly I. Sharendo, Belarus Academy of Sciences (Belarus)
Victor V. Boksha, Belarus Academy of Sciences (Belarus)
Eduard I. Tochitsky, Belarus Academy of Sciences (Belarus)
Vyjacheslav E. Obukhov, Belarus Academy of Sciences (Belarus)

Published in SPIE Proceedings Vol. 1804:
Rapid Thermal and Laser Processing
Dim-Lee Kwong; Heinrich G. Mueller, Editor(s)

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