Proceedings Paper
Good-quality silica optical waveguides formed by low-temperature-oxidation chemical vapor deposition technique| Format | Member Price | Non-Member Price |
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Paper Abstract
A new reactor--namely Select from Watkins Johnson--which is capable to deposit thick films of doped and undoped silicon oxide by low temperature oxidation (T < 500 degree(s)C) from silane and oxygen, has been used to realize 6 micrometers thick silica waveguides which are three- modal at a wavelength of 1.15 micrometers with an attenuation loss better than 1.0 dB/cm on as deposited film.
Paper Details
Date Published: 6 April 1993
PDF: 6 pages
Proc. SPIE 1794, Integrated Optical Circuits II, (6 April 1993); doi: 10.1117/12.141885
Published in SPIE Proceedings Vol. 1794:
Integrated Optical Circuits II
Ka-Kha Wong, Editor(s)
PDF: 6 pages
Proc. SPIE 1794, Integrated Optical Circuits II, (6 April 1993); doi: 10.1117/12.141885
Show Author Affiliations
Elio Cantatore, Politecnico di Bari (Italy)
Giosue Iseni, Pirelli Cavi SpA (Italy)
Giosue Iseni, Pirelli Cavi SpA (Italy)
Giorgio U. Pignatel, Univ. di Trento (Italy)
Published in SPIE Proceedings Vol. 1794:
Integrated Optical Circuits II
Ka-Kha Wong, Editor(s)
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