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Proceedings Paper

Good-quality silica optical waveguides formed by low-temperature-oxidation chemical vapor deposition technique
Author(s): Elio Cantatore; Giosue Iseni; Giorgio U. Pignatel
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Paper Abstract

A new reactor--namely Select from Watkins Johnson--which is capable to deposit thick films of doped and undoped silicon oxide by low temperature oxidation (T < 500 degree(s)C) from silane and oxygen, has been used to realize 6 micrometers thick silica waveguides which are three- modal at a wavelength of 1.15 micrometers with an attenuation loss better than 1.0 dB/cm on as deposited film.

Paper Details

Date Published: 6 April 1993
PDF: 6 pages
Proc. SPIE 1794, Integrated Optical Circuits II, (6 April 1993); doi: 10.1117/12.141885
Show Author Affiliations
Elio Cantatore, Politecnico di Bari (Italy)
Giosue Iseni, Pirelli Cavi SpA (Italy)
Giorgio U. Pignatel, Univ. di Trento (Italy)

Published in SPIE Proceedings Vol. 1794:
Integrated Optical Circuits II
Ka-Kha Wong, Editor(s)

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