Kinematically-mounted x-ray lithography masks are investigated to determine their response to imperfections in mounting, namely, misalignment of the clamping forces. Given the limited error budget for x-ray mask mounting, it is essential to minimize the mechanical distortions in the exposure area. Three-dimensional finite element models of the support ring, mask wafer and membrane are used to analyze the gravitational effects for both horizontal mounting (e- beam patterning) and vertical mounting (synchrotron exposure) coupled with the effects of misaligned clamping forces. In-plane distortions of the membrane are computed and the nodal displacements in the patterned area are uniquely mapped. Results of this study show the resultant membrane distortions due to imperfect mounting to be significant when considering 0.25 micrometers (or finer) technology.

Date Published: 9 July 1992
PDF: 7 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136026

Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)