Proceedings Paper
Electron-beam lithography of optical elements for x-ray range (Poster Paper)| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
Experimental investigations and special software for the e-beam exposure system gives the possibility of decreasing the influence of proximity effects and field distortion. The results of creating a focusing element for the soft x-ray range are described: amplitude and phase- contrast Fresnel zone plates as well as reflected Bragg-Fresnel lenses on the base of multilayer x-ray mirrors.
Paper Details
Date Published: 9 July 1992
PDF: 7 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136025
Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)
PDF: 7 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136025
Show Author Affiliations
Sergey V. Babin, Institute of Microelectronics Technology (Russia)
Alexei I. Erko, Institute of Microelectronics Technology (Russia)
Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)
© SPIE. Terms of Use
