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Proceedings Paper

Production of x-ray mask blanks for a point source stepper
Author(s): Lee E. Trimble; George K. Celler; John Frackoviak; James Alexander Liddle; Gary R. Weber
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Paper Abstract

Many requirements of a point-source x-ray membrane mask are unique, in comparison with masks used with synchrotron sources. Membranes must be thinner, flatter and stronger, for example. We characterize our choices of polysilicon and silicon-rich nitride for membranes, and a simplified one-piece (monolithic) mask blank. We use a dual strength testing technique which discerns whether membrane strength is limited by defects in the film growth process, or defects in the attachment of membrane to support. We find our membrane films are stronger than previously thought, and that improvements in membrane/support attachment will effect a more durable membrane mask.

Paper Details

Date Published: 9 July 1992
PDF: 7 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136016
Show Author Affiliations
Lee E. Trimble, AT&T Bell Labs. (United States)
George K. Celler, AT&T Bell Labs. (United States)
John Frackoviak, AT&T Bell Labs. (United States)
James Alexander Liddle, AT&T Bell Labs. (United States)
Gary R. Weber, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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