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Proceedings Paper

Advanced e-beam systems for manufacturing
Author(s): Hans C. Pfeiffer
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Paper Abstract

E-beam lithography systems are being employed as pattern generators in the semiconductor manufacturing process. The TV-like raster exposure of a scanning electron beam under computer control provides the resolution, flexibility, and accuracy needed for the generation of high density integrated circuit patterns. E-beam mask making has become the technology of choice, while e-beam direct writing on the wafer has remained largely a niche application. Here the throughput handicap of serial exposure presented an economic hurdle, which limited applications to exploratory research and prototyping rather than manufacturing--with few exceptions: IBM, for example, has applied its internally developed high-throughput EL-series systems worldwide in large scale manufacturing of ASIC-type bipolar logic products. The recent progress in state-of-the-art of manufacturing-oriented e-beam systems for mask making and direct writing, together with results achieved with these advanced systems, is the subject of this paper.

Paper Details

Date Published: 9 July 1992
PDF: 11 pages
Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136006
Show Author Affiliations
Hans C. Pfeiffer, IBM East Fishkill Facility (United States)

Published in SPIE Proceedings Vol. 1671:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Martin C. Peckerar, Editor(s)

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