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Proceedings Paper

Two-step photoionization and photophysics of color centers in LiF crystals
Author(s): Tasoltan T. Basiev; Sergey B. Mirov; Valerii V. Ter-Mikirtychev
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Paper Abstract

The results are presented of theoretical and experimental studies of two-step photoionization and photochemistry of color centers in LiF crystals. The exact analytic expressions were obtained for the population of optic centers energy levels in the process of two-step photoionization within a framework of kinetic equations in three-level approximation. A transfer from cw to pulsed-periodic excitation was analyzed. An analytic dependence was obtained of the ionization cross-section on the incident light flux intensity. For the first time the cross-section was estimated of the photoionization from the excited level of F2 color center in LiF crystal being pumped by 532 nm wavelength radiation. The processes were detected of mutual phototransformations of F3, F3+ and N color centers in oxygen-free LiF crystals. It was demonstrated that the presence of F3 and F3+ color centers in crystals is necessary for selective accumulation of N color centers at high temperature (300 K) action of Nd:YAG laser third harmonic radiation. In LiF- OH crystals the processes of mutual phototransformations were detected in a CC ensemble with absorption bands maxima at wavelengths 380 nm, 450 nm, and within the range 500 - 570 nm. It was demonstrated that an effective destruction of the CC absorption band (380 nm) along with the formation of absorption bands with maxima within 500 - 570 nm takes place under high-temperature (300 K) action of Nd:YAG laser third harmonic radiation ((lambda) equals 354 nm). Reverse phototransformation with the recovery of the band at 380 nm takes place along with the known phototransformation F2 (450 nm) yields F2+ (654 nm) under the subsequent action of the same laser second harmonic radiation ((lambda) equals 532 nm).

Paper Details

Date Published: 19 November 1992
PDF: 38 pages
Proc. SPIE 1839, Solid State Lasers and New Laser Materials, (19 November 1992); doi: 10.1117/12.131775
Show Author Affiliations
Tasoltan T. Basiev, General Physics Institute (Russia)
Sergey B. Mirov, General Physics Institute (Russia)
Valerii V. Ter-Mikirtychev, General Physics Institute (Russia)

Published in SPIE Proceedings Vol. 1839:
Solid State Lasers and New Laser Materials
Vyacheslav V. Osiko, Editor(s)

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