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Proceedings Paper

Traps in neutron-transmutation-doped silicon introduced by proton irradiation
Author(s): Viliam Nagl; Anders Hallen
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Paper Abstract

In this work, n-type neutron transmutation doped silicon irradiated by high energy, low dose protons have been investigated. Proton irradiation introduces deep energy levels in the bandgap of silicon, which act as recombination centers. Parameters of deep energy levels have been measured by the deep level transient spectroscopy (DLTS) method. Five electron traps and two hole traps have been observed. Deep energy levels are characterized by energy position in the bandgap, capture coefficients for majority carriers, and concentration profiles of trap densities. The possible identity of each trap is discussed with respect to data published in the literature.

Paper Details

Date Published: 1 August 1992
PDF: 7 pages
Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); doi: 10.1117/12.131056
Show Author Affiliations
Viliam Nagl, Slovak Technical Univ. (Slovak Republic)
Anders Hallen, Uppsala Univ. (Sweden)

Published in SPIE Proceedings Vol. 1783:
International Conference of Microelectronics: Microelectronics '92
Andrzej Sowinski; Jan Grzybowski; Witold T. Kucharski; Ryszard S. Romaniuk, Editor(s)

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