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Proceedings Paper

Influence of implanted ion charge on electrophysical parameters of formed structures
Author(s): Yakh'ya V. Fattakhov; Evelina Yu. Karas; Il'dus B. Khaibullin; Nadegda V. Kurbatova; Evgeny I. Shtyrkov
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Paper Abstract

It has been shown that during the implantation of some ions with the same energy but different charges, amorphous layers of different thickness are observed. To elucidate the reasons of the effect observed, new experiments using ellipsometric and electrophysical measurements have been carried out.

Paper Details

Date Published: 1 August 1992
PDF: 8 pages
Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992);
Show Author Affiliations
Yakh'ya V. Fattakhov, Kazan Physical-Technical Institute (Russia)
Evelina Yu. Karas, Kazan Physical-Technical Institute (Russia)
Il'dus B. Khaibullin, Kazan Physical-Technical Institute (Russia)
Nadegda V. Kurbatova, Kazan Physical-Technical Institute (Russia)
Evgeny I. Shtyrkov, Kazan Physical-Technical Institute (Russia)

Published in SPIE Proceedings Vol. 1783:
International Conference of Microelectronics: Microelectronics '92
Andrzej Sowinski; Jan Grzybowski; Witold T. Kucharski; Ryszard S. Romaniuk, Editor(s)

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