Proceedings Paper
Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)| Format | Member Price | Non-Member Price |
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Paper Abstract
The research of ways to increase the degree of integration and the functional possibilities of integrated circuits in recent years has resulted in the development of new investigations directed to the creation of new technological processes with high resolution. In the developing of submicron and nanometer technologies, physical and technical difficulties appear that are more critical in comparison with the problems of "old" classical microtechnology
Paper Details
Date Published: 1 June 1992
PDF: 54 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130373
Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)
PDF: 54 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130373
Show Author Affiliations
Dmitrii R. Ilkayev, Institute of Physics and Technology (Russia)
Tariel M. Makhviladze, Institute of Physics and Technology (Russia)
Tariel M. Makhviladze, Institute of Physics and Technology (Russia)
Kamil A. Valiev, Institute of Physics and Technology (Russia)
Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)
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