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Proceedings Paper

Novel laser microlithography system
Author(s): Guan-Qun Shen; Binchu Wu; Kangzhe Cai; Xuanshao Huang; Paiqi Cao
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Paper Abstract

A novelmicrolithographysystem with high precision and high performance is suggested in this paper. In the system, sub-micrometer focused laser beam was used to carve spot by spot on a disk, which was covered by photoresist and was mounted on a uniform turning stage. Pre-designed pattern can be obtained by two dimensional scanning which was realized by using a high precision turning stage and a high precision radial moving stage. The system has the advantages of high speed ( > 10meter sec for single laser beam), high precision (angle precision better than 0.2"), simple structure and using low price objective. We can not only make very large pattern (> 1011pixels), but also make a set of (eg. 5-6 pieces) masks using in LSIC production on one disk. Detailed principles and performances of the microlithography system will be introduced in this paper.

Paper Details

Date Published: 1 June 1992
PDF: 4 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130358
Show Author Affiliations
Guan-Qun Shen, Shanghai Institute of Laser Technology (China)
Binchu Wu, Shanghai Institute of Laser Technology (China)
Kangzhe Cai, Shanghai Institute of Laser Technology (China)
Xuanshao Huang, Shanghai Institute of Laser Technology (China)
Paiqi Cao, Shanghai Institute of Laser Technology (China)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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