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Proceedings Paper

Narrow band KrF excimer laser for mass production of ULSI ICs
Author(s): Hakaru Mizoguchi; Osamu Wakabayashi; Noritoshi Ito; Masahiko Kowaka; Junichi Fujimoto; Yukio Kobayashi; Takanobu Ishihara; Yoshiho Amada; Yasuhiro Nozue
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Paper Abstract

A narrow band KrF excimer laser system for lithography has been developed. Its durability has been proved up to 2 billion shots that correspond to one year operation in mass production line. The system has kept the average power of 6W with the power stability within +- 3% and the spectral line-width 1.2 pm (FWHM) with the wavelength stability within +- 0.2 pm. The integration of the spectrum has indicated that 95% of the spectral energy lay inside 4.6 pm band during 2 billion shots

Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130349
Show Author Affiliations
Hakaru Mizoguchi, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Noritoshi Ito, Komatsu Ltd. (Japan)
Masahiko Kowaka, Komatsu Ltd. (Japan)
Junichi Fujimoto, Komatsu Ltd. (Japan)
Yukio Kobayashi, Komatsu Ltd. (Japan)
Takanobu Ishihara, Komatsu Ltd. (Japan)
Yoshiho Amada, Komatsu Ltd. (Japan)
Yasuhiro Nozue, Komatsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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