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Proceedings Paper

Wavelength tuning for optimization of deep-UV excimer laser performance
Author(s): Susan K. Jones; Elliott Sean Capsuto; Bruce W. Dudley; Charles R. Peters; Gary C. Escher
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Paper Abstract

Experiments were performed to quantify the central laser wavelength setting which provided optimum imaging performance for two generations of deep UV steppers: GCA ALS Laserstep and GCA XLS Laserstep. Significant performance enhancements resulted by adjusting the central wavelength setting of the ALS system by -0.23 nm from the original baseline wavelength (point of minimum distortion). The baseline wavelength of the more advanced lens of the XLS system was closer to optimum, with acceptable imaging performance parameters over a >0.04 nm band. Lens characterization methodologies are described.

Paper Details

Date Published: 1 June 1992
PDF: 10 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130345
Show Author Affiliations
Susan K. Jones, Microelectronics Ctr. of North Carolina (United States)
Elliott Sean Capsuto, SEMATECH (United States)
Bruce W. Dudley, Microelectronics Ctr. of North Carolina (United States)
Charles R. Peters, Microelectronics Ctr. of North Carolina (United States)
Gary C. Escher, GCA-General Signal Corp. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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