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Proceedings Paper

New process technology for CD control in deep-submicron optical lithography
Author(s): Aritoshi Sugimoto; Osamu Suga; Kazuyuki Suko; Hitoshi Arakawa
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Paper Abstract

An effective and practical control technology of critical dimensions for submicron VSLI is presented. An ARCOR (Anti-Reflective Coating On Resist) process was improved, which is applied as a transparent type anti-reflective coating. A water soluble and low refractive index film was developed for this purpose. The following five items were measured experimentally and discussed : (1) amplitude of swing curve's dependence on resist thickness, (2) thickness latitude of the ARCOR film, (3) photo speed, (4) CD variations in a submicron DRAM and (5) alignment accuracy with a bright field alignment system.

Paper Details

Date Published: 1 June 1992
PDF: 8 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130317
Show Author Affiliations
Aritoshi Sugimoto, Hitachi, Ltd. (Japan)
Osamu Suga, Hitachi, Ltd. (Japan)
Kazuyuki Suko, Hitachi, Ltd. (Japan)
Hitoshi Arakawa, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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