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Proceedings Paper

Computer-aided optimal design of phase-shifting masks
Author(s): Chih-Yuan Chang; Charles D. Schaper; Thomas Kailath
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Paper Abstract

Phase-shifting masks are expected to improve the resolution of photolithography without renovation of exposure systems. However, the problem of finding an effective method for designing phase-shifting masks for arbitrary IC patterns has been open for several years. We propose here a computational strategy to solve this problem. The computational complexity of the proposed technique is 0(N3), where N is the total number of pixels on the image plane. Simulation results show that with optimally designed phase-shifting masks, 0.45?/NA contact hole, 0.45?/NA single space, and 0.30?/NA periodic lines/spaces may be printed.

Paper Details

Date Published: 1 June 1992
PDF: 8 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130310
Show Author Affiliations
Chih-Yuan Chang, Stanford Univ. (United States)
Charles D. Schaper, Stanford Univ. (United States)
Thomas Kailath, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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