A completely new class of planar optics has emerged using subwavelength metastructures and metasurfaces with a large contrast in dielectric constants. “High-contrast metastructure” refers to this type of optical material which is formed by a planar array of coupled-resonance structures, which are defined by high refractive index contrast boundaries that have dimensions comparable to the wavelength of interest. By manipulating the resonance of each individual structures with the collective periodic resonance, this metastructure allows very strong light-matter interaction within the thin planar material which provides a new platform to efficiently manipulate photons. Both 1D and 2D, uniform and chirped high-contrast gratings (HCGs), metastructures and metasurfaces are demonstrated to create mirrors, lenses, filters, polarizations, birefrigent elements, 3D display and many traditional bulk optical components. This has enabled simple fabrication of long-wavelength vertical-cavity surface-emitting lasers (VCSELs), dynamically tunable all-pass filters (APF) for fast optical beam steering, high-Q resonators with surface-normal and arbitrary angle output, enabling massive wafer-scale semiconductor lasers and optical filters. They are used to form hollow core waveguide for chip-scale ultra-low loss photonic delays. Vertical to in-plane waveguide coupler can be made with high efficiency for easy integration with Si-photonic circuits. Chirped HCGs are shown as excellent focusing reflectors and lenses with very high numerical apertures. Recently, active metasurface research has been pursued. Finally, simple but rigorous theoretical studies lead to intuitive device designs. The field has seen rapid advances in exciting experimental demonstrations and theoretical results as well as commercial flat-optics applications. Most recently, applications extended to near-to-eye displays in a variety of waveguide combiner architectures for Augmented Reality (AR) and Optical See-Through (OST) Mixed Reality (MR) Head Mounted Displays (HMDs). This conference aims to provide an international forum for presenting the latest results and reviewing technologies relevant to new physics and devices using high contrast subwavelength metastructures. Prospective authors are invited to submit original experimental and theoretical papers dealing with enabling technology for optoelectronic device integration either on Si, or III-V-based platforms.

Topics of particular interests include incorporation of high-contrast metastructures in the following:

metalens and diffractive optical elements for AR/VR HMD and 3D sensing
3D display and hologram: design, fabrication and applications
metasurface optical phase masks for phase and polarization control
topological lasers and high-Q resonators
VCSELs, tunable VCSELs and membrane lasers
broadband mirrors, lenses, and focusing mirrors
optomechanics: physics and devices
filters, tunable filters, WDM multiplexer and de-multiplexers
all-dielectric dissipation-less metamaterials
zero-index metamaterials and anisotropic metamaterials
bound states in the continuum
photonic topological insulator
response to both the electric and magnetic fields of light
support of large optical chirality and anisotropy
dispersion engineering
spectral tailoring and management for solar photovoltaic and solar thermal applications
slow light, fast light, and stop light devices
optical switches and modulators
metastructure waveguides
nonlinear optics; coherent optical mixers
optical amplifiers
omni mirrors and spatial-mode filtering
subwavelength plasmonics
manipulation of polarization
beam-steering devices
novel fabrication techniques and materials
Inverse design simulation modeling for metastructures/metasurfaces
photonic crystal devices, guided mode and leaky mode resonances.

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Conference OE303

High Contrast Metastructures XIV

Conference Chair

Connie J. Chang-Hasnain

Berxel Photonics Co., Ltd. (China)

Conference Chair

Andrea Alù

The City Univ. of New York Advanced Science Research Ctr. (United States)

Conference Chair

Weimin Zhou

DEVCOM Army Research Lab. (United States)

Program Committee

Amir Arbabi

Univ. of Massachusetts Amherst (United States)

Program Committee

Sang-Yeon Cho

DEVCOM Army Research Lab. (United States)

Program Committee

Jonathan A. Fan

Stanford Univ. (United States)

Program Committee

Andrei Faraon

Caltech (United States)

Program Committee

Patrice Genevet

Colorado School of Mines (United States)

Program Committee

Tingyi Gu

Univ. of Delaware (United States)

Program Committee

Boubacar Kanté

Univ. of California, Berkeley (United States)

Program Committee

Yuri S. Kivshar

The Australian National Univ. (Australia)

Program Committee

Arseniy I. Kuznetsov

A*STAR Institute of Materials Research and Engineering (Singapore)

Program Committee

Philippe Lalanne

Lab. Photonique, Numérique et Nanosciences (France)

Program Committee

John R. Lawall

National Institute of Standards and Technology (United States)

Program Committee

Tien-Chang Lu

National Yang Ming Chiao Tung Univ. (Taiwan)

Program Committee

Arka Majumdar

Univ. of Washington (United States)

Program Committee

Adam Overvig

The City Univ. of New York Advanced Science Research Ctr. (United States)

Program Committee

Bala Pesala

Council of Scientific & Industrial Research (India)

Program Committee

Jon A. Schuller

Univ. of California, Santa Barbara (United States)

Program Committee

Jason G. Valentine

Vanderbilt Univ. (United States)