Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV

Technologies for fabrication of optics and photonics at the micro- and nanoscale continue to advance and diversify due to rising demands for miniaturization, cost reduction, functional integration, and increased performance in optical and photonic systems. Examples include three-dimensional microoptics, topological photonics, photonic crystals, photonic metamaterials, plasmonic devices, sub-wavelength optics, microrefractive optics, diffractive optics, optical waveguides, and heterogeneously integrated active and passive micro- and nano-optical devices. These devices are playing increasing roles in a wide range of applications, including sensors, communications, imaging, biomedical, data storage, photovoltaics and other areas.

Both conventional and unconventional micro- and nanofabrication techniques serve as fundamental enablers for wide ranges of passive and active optical components and devices. To this end, this conference provides a forum for exchange of viewpoints and reports on new techniques and advances in fabrication methods for optics and photonics at the micro- and nanoscale. Applications enabled through these novel fabrication processes are also appropriate.

Topics of interest include, but are not limited to:

NON-CONVENTIONAL LITHOGRAPHY AND NOVEL APPROACHES

• two-photon processes for two-dimensional and three-dimensional micro- and nanostructures
• STED inspired lithography
• plasmonic lithography
• lithography with structured light
• nanoimprint lithography
• dip-pen lithography
• soft-lithography.

LITHOGRAPHIC FABRICATION APPROACHES

• three-dimensional laser lithography, three-dimensional microprinting
• fabrication methodologies based on binary, grayscale, and interferometric techniques
• additional techniques, such as additive lithography, and lift-off processes for sub-micron patterning.

ULTRAFAST LASER MICROMACHINING

• surface and bulk micromachining for micro- and nano-optics
• fabrication of 2D and 3D waveguides
• fabrication of novel optical elements.

ELECTRON AND ION BEAM FABRICATION OF MICRO- AND NANO-OPTICS

• three-dimensional structuring
• analog and multi-exposure methods
• unique patterning and beam controls.

MATERIALS ISSUES AND TECHNOLOGIES FOR MICRO- AND NANO-OPTICS

• light-matter interaction under ultra-short laser pulses
• two- and multiphoton-absorption processes
• photochemistry under ultra-short laser exposure
• three-dimensional micro- and nano-optics and freeform surfaces
• replication in polymer, metals and other materials
• novel photoresists.

PROCESSING OF NANOPHOTONIC DEVICES

• holographic lithography and multi-beam exposure methods
• nanopatterning for site selective growth
• texturing and patterning for enhanced light extraction
• fabrication of plasmonic devices
• quantum device fabrication for micro and nano-optics.

MICRO- AND NANO-OPTICAL INTEGRATION AND MANUFACTURING

• passive and/or active integration
• quality and metrology issues
• volume fabrication techniques for micro- and nano-optics and photonics.

JOINT SESSION with OE401 and OE403
Advanced Fabrication using a Digital Micromirror Device or MEMS Array
Active research in the fields of advanced fabrication and MEMS Arrays, such as the digital micromirror device, have shown application and promise for implementing lithography and other forms of high precision printing. The purpose of this joint session is to explore the relationships between MEMS technology and fabrication as they relate to:

• 3D printing
• additive manufacturing
• lithography
• structured light.

JOINT SESSION with OE401 and LASE LA401
3D Printing
The purpose of this joint session is to emphasize the growing field of laser printing/fabrication of micro/nano-sized structures for optics and photonics.