The Moscone Center
San Francisco, California, United States
6 - 11 March 2021
San Francisco, California, United States
6 - 11 March 2021
This conference has an open call for papers:
submit an abstract
(sign in required)
Submission guidelines for Authors and Presenters
submit an abstract
(sign in required)
Submission guidelines for Authors and Presenters
Important Dates
Abstract Due:
26 August 2020
Author Notification:
2 November 2020
Manuscript Due Date:
16 February 2021
26 August 2020
Author Notification:
2 November 2020
Manuscript Due Date:
16 February 2021
Conference Cosponsors
Additional Conference Information
Call for
Papers
Papers
Technologies for fabrication of optics and photonics at the micro- and nanoscale continue to advance and diversify due to rising demands for miniaturization, cost reduction, functional integration, and increased performance in optical and photonic systems. Examples include three-dimensional microoptics, topological photonics, photonic crystals, photonic metamaterials, plasmonic devices, sub-wavelength optics, microrefractive optics, diffractive optics, optical waveguides, and heterogeneously integrated active and passive micro- and nano-optical devices. These devices are playing increasing roles in a wide range of applications, including sensors, communications, imaging, biomedical, data storage, photovoltaics and other areas.
Both conventional and unconventional micro- and nanofabrication techniques serve as fundamental enablers for wide ranges of passive and active optical components and devices. To this end, this conference provides a forum for exchange of viewpoints and reports on new techniques and advances in fabrication methods for optics and photonics at the micro- and nanoscale. Applications enabled through these novel fabrication processes are also appropriate.
Topics of interest include, but are not limited to:
NON-CONVENTIONAL LITHOGRAPHY AND NOVEL APPROACHES
LITHOGRAPHIC FABRICATION APPROACHES
ULTRAFAST LASER MICROMACHINING
ELECTRON AND ION BEAM FABRICATION OF MICRO- AND NANO-OPTICS
MATERIALS ISSUES AND TECHNOLOGIES FOR MICRO- AND NANO-OPTICS
PROCESSING OF NANOPHOTONIC DEVICES
MICRO- AND NANO-OPTICAL INTEGRATION AND MANUFACTURING
JOINT SESSION with OE401 and OE403
Advanced Fabrication using a Digital Micromirror Device or MEMS Array
Active research in the fields of advanced fabrication and MEMS Arrays, such as the digital micromirror device, have shown application and promise for implementing lithography and other forms of high precision printing. The purpose of this joint session is to explore the relationships between MEMS technology and fabrication as they relate to:
JOINT SESSION with OE401 and LASE LA401
3D Printing
The purpose of this joint session is to emphasize the growing field of laser printing/fabrication of micro/nano-sized structures for optics and photonics.
BEST PAPER AWARDS
We are pleased to announce that a cash prize, sponsored by Nanoscribe GmbH, will be awarded to the best paper and best student paper in this conference. Qualifying papers will be evaluated by the awards committee. Manuscripts will be judged based on scientific merit, impact, and clarity. The winners will be announced during the conference and the presenting authors will be awarded a cash prize.
To be eligible for the Best Paper Award, you must:
To be eligible for the Best Student Paper Award, you must:
Nominations
All submitted papers will be eligible for the awards if they meet the above criteria.
Both conventional and unconventional micro- and nanofabrication techniques serve as fundamental enablers for wide ranges of passive and active optical components and devices. To this end, this conference provides a forum for exchange of viewpoints and reports on new techniques and advances in fabrication methods for optics and photonics at the micro- and nanoscale. Applications enabled through these novel fabrication processes are also appropriate.
Topics of interest include, but are not limited to:
NON-CONVENTIONAL LITHOGRAPHY AND NOVEL APPROACHES
- two-photon processes for two-dimensional and three-dimensional micro- and nanostructures
- STED inspired lithography
- plasmonic lithography
- lithography with structured light
- nanoimprint lithography
- dip-pen lithography
- soft-lithography.
LITHOGRAPHIC FABRICATION APPROACHES
- three-dimensional laser lithography, three-dimensional microprinting
- fabrication methodologies based on binary, grayscale, and interferometric techniques
- additional techniques, such as additive lithography, and lift-off processes for sub-micron patterning.
ULTRAFAST LASER MICROMACHINING
- surface and bulk micromachining for micro- and nano-optics
- fabrication of 2D and 3D waveguides
- fabrication of novel optical elements.
ELECTRON AND ION BEAM FABRICATION OF MICRO- AND NANO-OPTICS
- three-dimensional structuring
- analog and multi-exposure methods
- unique patterning and beam controls.
MATERIALS ISSUES AND TECHNOLOGIES FOR MICRO- AND NANO-OPTICS
- light-matter interaction under ultra-short laser pulses
- two- and multiphoton-absorption processes
- photochemistry under ultra-short laser exposure
- three-dimensional micro- and nano-optics and freeform surfaces
- replication in polymer, metals and other materials
- novel photoresists.
PROCESSING OF NANOPHOTONIC DEVICES
- holographic lithography and multi-beam exposure methods
- nanopatterning for site selective growth
- texturing and patterning for enhanced light extraction
- fabrication of plasmonic devices
- quantum device fabrication for micro and nano-optics.
MICRO- AND NANO-OPTICAL INTEGRATION AND MANUFACTURING
- passive and/or active integration
- quality and metrology issues
- volume fabrication techniques for micro- and nano-optics and photonics.
JOINT SESSION with OE401 and OE403
Advanced Fabrication using a Digital Micromirror Device or MEMS Array
Active research in the fields of advanced fabrication and MEMS Arrays, such as the digital micromirror device, have shown application and promise for implementing lithography and other forms of high precision printing. The purpose of this joint session is to explore the relationships between MEMS technology and fabrication as they relate to:
- 3D printing
- additive manufacturing
- lithography
- structured light.
JOINT SESSION with OE401 and LASE LA401
3D Printing
The purpose of this joint session is to emphasize the growing field of laser printing/fabrication of micro/nano-sized structures for optics and photonics.
BEST PAPER AWARDS
We are pleased to announce that a cash prize, sponsored by Nanoscribe GmbH, will be awarded to the best paper and best student paper in this conference. Qualifying papers will be evaluated by the awards committee. Manuscripts will be judged based on scientific merit, impact, and clarity. The winners will be announced during the conference and the presenting authors will be awarded a cash prize.
To be eligible for the Best Paper Award, you must:
- be listed as an author on an accepted paper within this conference
- have conducted the majority of the work to be presented
- submit your manuscript online by 5 January 2021
- present your paper as scheduled.
To be eligible for the Best Student Paper Award, you must:
- be a student without a doctoral degree (undergraduate, graduate, or PhD student)
- submit your abstract online, and select “Yes” when asked if you are a full-time student, and select yourself as the speaker
- when submitting your abstract, under TOPIC selection, choose “Consider for Best Student Paper Award”
- be the presenting author on an accepted paper within this conference
- have conducted the majority of the work to be presented
- submit your manuscript online by 5 January 2021
- present your paper as scheduled.
Nominations
All submitted papers will be eligible for the awards if they meet the above criteria.
This conference has an open call for papers:
submit an abstract
(sign in required)
Submission guidelines for Authors and Presenters
submit an abstract
(sign in required)
Submission guidelines for Authors and Presenters
Conference Committee
Conference Chairs
Program Committee
- Georg von Freymann, Technische Univ. Kaiserslautern (Germany)
- Eva Blasco, Karlsruher Institut für Technologie (Germany)
- Debashis Chanda, Univ. of Central Florida (United States)
Program Committee
- Cornelia Denz, Westfälische Wilhelms-Univ. Münster (Germany)
- Ruth Houbertz, Multiphoton Optics GmbH (Germany)
- Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
- Stephen M. Kuebler, Univ. of Central Florida (United States)
- Mangirdas Malinauskas, Vilnius Univ. (Lithuania)
- Robert R. McLeod, Univ. of Colorado at Boulder (United States)
Program Committee continued...
- Hernán R. Míguez García, Institute of Materials Science of Seville (Spain)
- Aaron J. Pung, Sandia National Labs. (United States)
- John A. Rogers, Northwestern Univ. (United States)
- Raymond C. Rumpf, The Univ. of Texas at El Paso (United States)
- Winston V. Schoenfeld, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
- Thomas J. Suleski, The Univ. of North Carolina at Charlotte (United States)
- Michael Thiel, Nanoscribe GmbH (Germany)
- Sandra Wolff, Technische Univ. Kaiserslautern (Germany)
