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Online Only
6 - 11 March 2021
Conference 11696
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV
Conference Committee
Important Dates
Abstract Due:
26 August 2020

Author Notification:
9 November 2020

Manuscript Due Date:
12 February 2021

Conference Cosponsors
Additional Conference Information
This conference is accepting post-deadline submissions:
Post-Deadline Submission Portal
Tuesday 19 January Show All Abstracts
Welcome and Introduction
Welcome and Introduction to SPIE Conference 11696
Paper 11696-800
Author(s): Georg von Freymann, Technische Univ. Kaiserslautern (Germany); Eva Blasco, Karlsruher Institut für Technologie (Germany); Debashis Chanda, Univ. of Central Florida (United States)
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Session 1: Advanced Electron- and Ion-beam Fabrication
Cascade domino lithography for extreme photon squeezing (Invited Paper)
Paper 11696-1
Author(s): Junsuk Rho, Inki Kim, Jungho Mun, Pohang Univ. of Science and Technology (Korea, Republic of)
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Reactive ion beam etch of slanted gratings for augmented reality
Paper 11696-2
Author(s): Vincent Ip, Frederick Pearsall, Tania Henry, Riju Singhal, Veeco Instruments Inc. (United States)
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Single camera shot Fresnel incoherent correlation holography
Paper 11696-3
Author(s): Vijayakumar Anand, Tomas Katkus, Stefan Lundgaard, Swinburne Univ. of Technology (Australia); Denver Linklater, RMIT Univ. (Australia); Soon Hock Ng, Jovan Maksimovic, Swinburne Univ. of Technology (Australia); Elena P. Ivanova, RMIT Univ. (Australia); Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
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Five-dimensional imaging with a coded pinhole array
Paper 11696-4
Author(s): Vijayakumar Anand, Soon Hock Ng, Jovan Maksimovic, Swinburne Univ. of Technology (Australia); Denver Linklater, RMIT Univ. (Australia); Tomas Katkus, Stefan Lundgaard, Swinburne Univ. of Technology (Australia); Elena P. Ivanova, RMIT Univ. (Australia); Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
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200mm NIL master with opposing slanted surface relief gratings utilizing reactive ion beam etching
Paper 11696-5
Author(s): Bradley Williams, MOXTEK, Inc. (United States); Sebastien P. Pochon, David I. Pearson, Ferreira Joao, Stephanie Baclet, Oxford Instruments Plasma Technology Ltd. (United Kingdom); Kevin Black, Rumyana V. Petrova, Daniel Bacon-Brown, Matthew C. George, Arash Farhang, MOXTEK, Inc. (United States)
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Session 2: Metasurfaces and Metamaterials
Infrared photodetectors and microspectrometers based on plasmonics and two-dimensional materials (Invited Paper)
Paper 11696-6
Author(s): Kenneth B. Crozier, The Univ. of Melbourne (Australia)
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Nanostructured metasurfaces for optical wavefront manipulation (Invited Paper)
Paper 11696-7
Author(s): Michele Cotrufo, Shuwei Guo, Adam Overvig, Andrea Alù, The City Univ. of New York (United States)
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Single-step manufacturing of high-efficiency dielectric metasurfaces and metalenses
Paper 11696-8
Author(s): Junsuk Rho, Gwanoho Yoon, Pohang Univ. of Science and Technology (Korea, Republic of)
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Self-assembled angle-independent plasmonic structural color paint
Paper 11696-9
Author(s): Pablo Cencillo-Abad, Pamela Mastranzo-Ortega, Daniel Franklin, UCF NanoScience Technology Ctr. (United States); Debashis Chanda, UCF NanoScience Technology Ctr. (United States), CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
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Femtosecond laser fabrication of diffractive optics for spatial and spectral imaging at synchrotron infrared beamlines
Paper 11696-10
Author(s): Tomas Katkus, Vijayakumar Anand, Soon Hock Ng, Swinburne Univ. of Technology (Australia); Jitraporn Vongsvivut, ANSTO-Australian Synchrotron (Australia); Stefan Lundgaard, Swinburne Univ. of Technology (Australia); Denver Linklater, RMIT Univ. (Australia); Jovan Maksimovic, Swinburne Univ. of Technology (Australia); Keith Bambery, Mark J. Tobin, ANSTO-Australian Synchrotron (Australia); Elena P. Ivanova, RMIT Univ. (Australia); Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
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Session 3: Nanoplasmonics
Plasmonic waveguide lithography for patterning nanostructures with high aspect-ratio and large-area uniformity (Invited Paper)
Paper 11696-11
Author(s): Xi Chen, Kaito Yamada, Lingjie Jay Guo, Univ. of Michigan (United States)
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Superchiral light generation on nanoimprinted achiral plasmonic substrates for chiral drug detection
Paper 11696-12
Author(s): Aritra Biswas, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States); Abraham Vázquez-Guardado, Northwestern Univ. (United States); Debashis Chanda, Univ. of Central Florida (United States)
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Nanopatterned graphene based long wavelength infrared detectors at room temperature
Paper 11696-13
Author(s): Tianyi Guo, Univ. of Central Florida (United States); Alireza Safaei, Univ. of Illinois (United States); Sayan Chandra, Appalachian State Univ. (United States); Debashis Chanda, Univ. of Central Florida (United States)
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Self-assembled plasmonic metamaterials with unnaturally high optical refraction
Paper 11696-14
Author(s): Ji-Hyeok Huh, Jaewon Lee, Seungwoo Lee, Korea Univ. (Korea, Republic of)
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Photothermal energy conversion in plasmonic nanoantennas as a new path for the local growth of ZnO in nanophotonic devices
Paper 11696-15
Author(s): Christophe Pin, Hokkaido Univ. (Japan); Hideki Fujiwara, Hokkai-Gakuen Univ. (Japan); Tatsuro Suzuki, Keiji Sasaki, Hokkaido Univ. (Japan)
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Session 4: Micro-optic/-fluidic Devices
Additive and subtractive manufacturing process by hybrid laser material processing (Invited Paper)
Paper 11696-16
Author(s): Kotaro Obata, Shi Bai, Koji Sugioka, RIKEN Ctr. for Advanced Photonics (Japan)
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Two-step MEMS microfabrication via 3D direct laser lithography (Invited Paper)
Paper 11696-17
Author(s): Omar Tricinci, Marco Carlotti, Andrea Desii, Virgilio Mattoli, Istituto Italiano di Tecnologia (Italy)
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Fabrication of optical components and micro- and nanofluidic devices in polymers by 172 nm direct photoablation
Paper 11696-18
Author(s): Andrey E. Mironov, Univ. of Illinois (United States), Cygnus Photonics (United States); Jinhong Kim, Austin W. Steinforth, Sehyun Park, Univ. of Illinois (United States); Dane J. Sievers, Sung-Jin Park, James G. Eden, Univ. of Illinois (United States), Cygnus Photonics (United States)
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CAD-based metrology of freeform microlens arrays (FMLAs)
Paper 11696-19
Author(s): Tamara Aderneuer, Oscar Fernandez, Rolando Ferrini, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
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Multicomponent structure assembly with optical tweezers
Paper 11696-20
Author(s): Jeffrey E. Melzer, Euan McLeod, Wyant College of Optical Sciences (United States)
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Session 5: Novel Materials
Micro/nanofabrication of chalcogenide hybrid inorganic-organic polymers for infrared photonics applications (Invited Paper)
Paper 11696-21
Author(s): Robert A. Norwood, Wyant College of Optical Sciences (United States)
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Ultra-high refractive index polymers in the visible wavelength for nanoimprint lithography
Paper 11696-22
Author(s): Carlos A. Pina-Hernandez, Adam Legacy, HighRI Optics, Inc. (United States); Stefano Cabrini, The Molecular Foundry (United States), Lawrence Berkeley National Lab. (United States); Keiko Munechika, HighRI Optics, Inc. (United States)
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Nano 3D printable low refractive index 1.33 resin and microscopic prints with no cytotoxicity effect
(Canceled)
Paper 11696-23
Author(s):
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A universal bio-based resin for a multi-platform and meso-scale optical 3D printing
Paper 11696-24
Author(s): Edvinas Skliutas, Vilnius Univ. (Lithuania); Migle Lebedevaite, Sigita Kasetaite, Kaunas Univ. of Technology (Lithuania); Sima Rekstyte, Vilnius Univ. (Lithuania); Saulius Lileikis, 3D Creative Ltd. (Lithuania); Jolita Ostrauskaite, Kaunas Univ. of Technology (Lithuania); Mangirdas Malinauskas, Vilnius Univ. (Lithuania)
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Session 6: Large Area Fabrication
Roll-to-plate nanoimprint lithography for high volume production: equipment, materials, and processes
Paper 11696-25
Author(s): Jan Matthijs ter Meulen, Pim Veldhuizen, Sander Kommeren, Erhan Ercan, Gary Tam, Bram Titulaer, Morphotonics B.V. (Netherlands)
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Uniform large area super-resolved interference lithography via beam scanning
Paper 11696-26
Author(s): David B. Miller, Univ. of Colorado Boulder (United States); Adam M. Jones, Sandia National Labs. (United States); Robert R. McLeod, Univ. of Colorado Boulder (United States)
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Large area > 1 cm2 light trapping patterns for Si solar cells
Paper 11696-27
Author(s): Saulius Juodkazis, Jovan Maksimovic, Jingwen Hu, Soon Hock Ng, Tomas Katkus, Swinburne Univ. of Technology (Australia); Yoshiaki Nishijima, Yokohama National Univ. (Japan); Sajeev John, Univ. of Toronto (Canada)
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SCIL wafer scale direct nanoimprint for nanophotonic components and fast optical quality inspection with single nm resolution
Paper 11696-28
Author(s): Marc A. Verschuuren, Teun Nevels, SCIL Nanoimprint Solutions (Netherlands); Mohammad Ramezani, TeraNova B.V. (Netherlands); Jeroen Visser, Rob Voorkamp, SCIL Nanoimprint Solutions (Netherlands)
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Session 7: Advanced Manufacturing using DMD or SLM: Joint Session with 11696/11698
High-resolution microfabrication through a graded-index multimode optical fiber
Paper 11696-29
Author(s): Georgia Konstantinou, Damien Loterie, Eirini Kakkava, Demetri Psaltis, Christophe Moser, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
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Design of thermo-mechanical properties of highly reliable, UV-curable optical polymers
Paper 11696-30
Author(s): Patrick Heissler, Markus Brehm, Isabel Pilottek, DELO Industrie Klebstoffe GmbH & Co. KGaA (Germany)
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Mitigating scattering effects in DMD-based 3D printing using machine learning
Paper 11698-1
Author(s): Shangting You, Jiaao Guan, Shaochen Chen, Univ. of California, San Diego (United States)
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Optical configurations for image projection into a cylindrical volume for volumetric additive manufacturing
Paper 11698-2
Author(s): Bryan Moran, Erika Fong, Caitlyn Cook, Maxim Shusteff, Lawrence Livermore National Lab. (United States)
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Breaking the resolution and speed limit: Next-generation technology for scalable micro additive manufacturing (Invited Paper)
Paper 11698-3
Author(s): Shih-Chi Chen, The Chinese Univ. of Hong Kong (Hong Kong, China)
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Modeling of light propagation in computed axial lithography with photopolymers (Invited Paper)
Paper 11698-4
Author(s): Hayden K. Taylor, Joseph Toombs, Sui Man Luk, Samira Feili, Hossein Heidari, Chi Chung Li, Univ. of California, Berkeley (United States); Vishal Bansal, Foothill High School (United States); Kevin Coulson, Univ. of California, Berkeley (United States)
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Digital printing of hydrogel based diffractive optical elements (hDOEs)
Paper 11696-31
Author(s): Zheng Xiong, Pranav Soman, Syracuse Univ. (United States)
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Session 8: 3D Laser Lithography
Multi-material micro stereolithography using multiple droplets of photopolymers (Invited Paper)
Paper 11696-32
Author(s): Shoji Maruo, Yokohama National Univ. (Japan)
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Recent progress on 3D laser micro- and nanoprinting (Invited Paper)
Paper 11696-33
Author(s): Martin Wegener, Karlsruher Institut für Technologie (Germany)
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Glassy free-form 3D micro-optics enabled via ultrafast laser 3D nanolithography
Paper 11696-34
Author(s): Simonas Varapnickas, Vilnius Univ. (Lithuania); Meguya Ryu, Tokyo Institute of Technology (Japan); Darius Gailevicius, Vilnius Univ. (Lithuania); Tai Suzuki, Tokyo Institute of Technology (Japan); Greta Merkininkaite, Vilnius Univ. (Lithuania); Simas Sakirzanovas, Vilnius Univ. (Lithuania); Junko Morikawa, Tokyo Institute of Technology (Japan); Saulius Juodkazis, Swinburne Univ. of Technology (Australia); Mangirdas Malinauskas, Vilnius Univ. (Lithuania)
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3D printed optical waveguides based on photonic crystal fiber designs
Paper 11696-35
Author(s): Andrea Bertoncini, Carlo Liberale, King Abdullah Univ. of Science and Technology (Saudi Arabia)
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New material measure for the calibration of areal-optical measuring instruments and its demands on fabrication
Paper 11696-36
Author(s): Julian Hering, Technische Univ. Kaiserslautern (Germany), Opti-Cal GmbH (Germany)
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3D printing of structural colors and holograms (Invited Paper)
(Canceled)
Paper 11696-37
Author(s):
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Manipulation of reflectance and photon lifetime distribution in strongly scattering white structures by tailoring structural properties
Paper 11696-38
Author(s): Dominic Meiers, Technische Univ. Kaiserslautern (Germany); Ruben Pompe, Walter Pfeiffer, Univ. Bielefeld (Germany); Georg von Freymann, Technische Univ. Kaiserslautern (Germany), Fraunhofer-Institut für Techno- und Wirtschaftsmathematik ITWM (Germany)
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Session PS: Poster Session
RIE fabrication method of ARS for plastic lens
Paper 11696-39
Author(s): Kenji Tanibe, Kazuya Yamamoto, Nalux Co., Ltd. (Japan)
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Localized surface plasmon resonance in refractory metamaterials
Paper 11696-40
Author(s): Minsu Oh, Emily Carlson, Thomas Vandervelde, Tufts Univ. (United States)
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Conference Committee
Conference Chairs
  • Georg von Freymann, Technische Univ. Kaiserslautern (Germany)
  • Eva Blasco, Karlsruher Institut für Technologie (Germany)
  • Debashis Chanda, Univ. of Central Florida (United States)

Program Committee
Program Committee continued...
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