Nantong International Convention & Exhibition Center (NTICEC)
Nantong, Jiangsu, China
10 - 12 October 2021
Conference PA110
Optical Metrology and Inspection for Industrial Applications VIII
Conference Committee
Important Dates
Abstract Due:
7 June 2021
Deadline Extended

Author Notification:
6 July 2021

Manuscript Due Date:
20 September 2021

Additional Conference Information
Call for
Papers on the following and related topics are solicited for this conference:
  • absolute testing for metrology
  • application of interferometric techniques in optical mask and LED industry
  • large optics testing
  • machine/robot vision methods, architectures, and applications
  • surface inspection methods and applications
  • flatness metrology
  • dynamic measurement
  • special optical systems for inspection and measurements
  • 2D and 3D machine vision methods and applications
  • 3D data manipulation
  • detection of gravitational waves
  • freeform testing
  • super-high accurate measurement for smooth surfaces
  • micro- and nano-scale measurement methods
  • structured light methods and applications
  • phase shifting methods applied to industrial inspection
  • optical methods for dimensional and surface metrology
  • mechanic-optics and photonics for metrology and inspection
  • system calibration and error analysis
  • spherical and asperical measurements
  • on-line and process control measurements
  • deflectometry or fringe projection measurement
  • on-machine tool measurements of shape and finish
  • high-resolution and high-speed inspection applications.
Conference Committee
Conference Chairs
  • Sen Han, Univ. of Shanghai for Science and Technology (China), Suzhou H&L Instruments LLC (China)
  • Gerd Ehret, Physikalisch-Technische Bundesanstalt (Germany)
  • Benyong Chen, Zhejiang Sci-Tech Univ. (China)

Program Committee
Program Committee continued...
  • Jaejoong Kwon, SAMSUNG Display Co., Ltd. (Korea, Republic of)
  • Guohai Situ, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
  • H. Philip Stahl, NASA Marshall Space Flight Ctr. (United States)
  • John C. Stover, The Scatter Works Inc. (United States)
  • Takamasa Suzuki, Niigata Univ. (Japan)
  • Toshitaka Wakayama, Saitama Medical Univ. (Japan)
  • Haoyu Wang, Univ. of Shanghai for Science and Technology (China)
  • Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
  • Yajun Wang, Wuhan Univ. (China)
  • Quanying Wu, Suzhou Univ. of Science and Technology (China)
  • Jiangtao Xi, Univ. of Wollongong (Australia)
  • Jing Xu, Tsinghua Univ. (China)
  • Lianxiang Yang, Oakland Univ. (United States)
  • Dawei Zhang, Univ. of Shanghai for Science and Technology (China)
  • Hao Zhang, Tianjin Univ. (China)
  • Qican Zhang, Sichuan Univ. (China)
  • Xiangchao Zhang, Fudan Univ. (China)
  • Zonghua Zhang, Hebei Univ. of Technology (China)
  • Ping Zhou, ASML US, Inc. (United States)
  • Ping Zhong, Donghua Univ. (China)
  • Weihu Zhou, Institute of Microelectronics, Chinese Academy of Sciences (China)
  • Chao Zuo, Nanjing Univ. of Science and Technology (China)

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