7 - 10 April 2025
Prague, Czech Republic
The conference will be devoted to the study of damages to optical elements and fusion reactor components and patterning of material surfaces irradiated by high average and/or high peak fluxes of radiation in the extreme ultraviolet and x-ray spectral regions. The following main subjects will be covered by the conference: Special attention will be paid to the practical importance of these subjects to direct EUV/x-ray micro(nano)structuring, EUV/x-ray nanolithography, testing the materials related to inertial fusion reactors, manipulation/characterization of radiation emitted from new EUV/x-ray lasers and other ultra-intense source. ;
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Conference OO112

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam9)

This conference has an open call for papers:
Author Notification: 24 January 2025
Manuscript Due: 19 March 2025
The conference will be devoted to the study of damages to optical elements and fusion reactor components and patterning of material surfaces irradiated by high average and/or high peak fluxes of radiation in the extreme ultraviolet and x-ray spectral regions. The following main subjects will be covered by the conference:
  • EUV/x-ray radiation induced degradation of optics and sensors
  • utilization of EUV/x-ray sources for testing radiation resistance of first walls, debris shields and final optics in prospective IFE reactors
  • strategies for the design of optical elements to avoid or reduce their EUV/x-ray radiation damage
  • calculations of damage limits for optical components used with intense short-wavelength radiation sources
  • irreversible changes occurring in solids exposed to synchrotron radiation, high-order harmonics, discharge- and laser-plasma based sources of incoherent EUV/x-ray radiation, and EUV/x-ray laser beams, including free-electron lasers (FELs)
  • chain scissions and crosslinking in EUV/x-ray-exposed polymers, esp. EUV/x-ray resists
  • relationships between EUV/x-ray desorption, ablation and phase transitions
  • transient phenomena pumped and/or probed by short or ultra-short EUV/x-ray pulses
  • influence of radiation damage to samples on their imaging and structural analysis
  • EUV/x-ray laser induced periodic surface structures (EUV/x-ray LIPSS)
  • direct micro- and nano-patterning by intense EUV/x-ray radiation modulated by masks or in interferometers
  • optimization of irradiation conditions to produce tailored micro(nano)structures
  • comparing responses of thin film coatings, multilayer structures, gratings and bulk materials to intense short-wavelength radiation
  • interaction of intense EUV/x-ray radiation with gases and liquids: photoionization plasmas, additive nanolithography and related issues
  • formation of carbonaceous deposit (carbon black) from residual gases on irradiated surfaces
  • radiation damage to interfaces
  • formation of carbonaceous deposit (carbon black) from residual gases on irradiated surfaces
  • advanced diagnostics for investigation of formation and development changes initiated in and on various materials and structures by intense EUV/x-ray radiation
  • thermally induced transient deformations of optical surfaces and related wave-front changes (thermal lensing)
  • challenges for radiation damage and material processing studies associated with the current development of compact, high-repetition EUV/x-ray free-electron lasers, often called cw FELs
  • utilization of damage patterns on irradiated surfaces to characterize the EUV/x-ray radiation field
  • analytical techniques and procedures for detailed characterization of changes in irradiated condensed phase
  • computer simulation of processes induced in solids by EUV/x-ray pulses at microscopic and macroscopic levels.
Special attention will be paid to the practical importance of these subjects to direct EUV/x-ray micro(nano)structuring, EUV/x-ray nanolithography, testing the materials related to inertial fusion reactors, manipulation/characterization of radiation emitted from new EUV/x-ray lasers and other ultra-intense source.
Conference Chair
Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Conference Chair
Deutsches Elektronen-Synchrotron (Germany)
Conference Chair
CEA-DRF-IRAMIS, Lab. des Solides Irradiés (France)
Program Committee
Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Program Committee
Military Univ. of Technology (Poland)
Program Committee
SLAC National Accelerator Lab. (United States)
Program Committee
Univ. Twente (Netherlands)
Program Committee
Laser-Lab. Göttingen e.V. (Germany)
Program Committee
Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Program Committee
Czech Technical Univ. in Prague (Czech Republic)
Program Committee
Colorado State Univ. (United States)
Program Committee
Helmholtz-Zentrum Geesthacht (Germany)
Program Committee
Univ. degli Studi di Torino (Italy)
Program Committee
Ecole Nationale Supérieure de Techniques Avancées (France)
Program Committee
Deutsches Elektronen-Synchrotron (Germany)
Additional Information

View call for papers


What you will need to submit

  • Presentation title
  • Author(s) information
  • Speaker biography (1000-character max including spaces)
  • Abstract for technical review (200-300 words; text only)
  • Summary of abstract for display in the program (50-150 words; text only)
  • Keywords used in search for your paper (optional)
Note: Only original material should be submitted. Commercial papers, papers with no new research/development content, and papers with proprietary restrictions will not be accepted for presentation.