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Micro/Nano Lithography

Cymer pushes high-yielding EUV source to 55W

Optics.org

Cymer has demonstrated a 40W extreme ultraviolet (EUV) source in an ASML lithography scanner at a high duty cycle capable of patterning 30 silicon wafers per hour, while at 55 W the same source has shown promising performance.

David Brandt, Senior Director of EUV Marketing and Business Development at Cymer (San Diego, CA) tells SPIE Newsroom about the latest advances in a video recorded at SPIE Advanced Lithography 2013.

Full story from Optics.org