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SPIE Advanced Lithography 2013 Event Photos and Video

 

Plenary talk multimedia (audio + slides):

William (Bill) Siegle Bill Siegle (Independent Consultant): Contact Printing to EUV: Lessons Learned from the Art of Lithography (36:15)
Howard Ko Howard Ko (Synopsys):  Evolution of EDA Alongside Rapid Silicon Technology Innovation (44:41)
Charles Szmanda Charles Szmanda (Patent Practice of Szmanda & Shelnut): New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy (46:31)

 


 

Posters-II: Metrology/Inspection, Resists, Etch

In the exhibition

Posters-I: EUV, Alternative Technologies, Optical Metrology, DFM

New Fellows of the Society

Best Paper awards

Coffee ... and networking!

 


 

Return to event news

For copies of photographs, email media@spie.org.

 


Posters-II: Metrology, Resists, Etch

Advanced Lithography poster reception

Advanced Lithography poster reception

Advanced Lithography poster reception

Advanced Lithography poster reception

Advanced Lithography poster reception

Advanced Lithography poster reception

 


In the exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

Advanced Lithography exhibition

 


Posters-I: EUV, Alternative Technologies, Optical Metrology, DFM

Advanced Lithography poster session

Advanced Lithography poster session

Advanced Lithography poster session

Advanced Lithography poster session

Advanced Lithography poster session

Advanced Lithography poster session

Advanced Lithography poster session

 


New Fellows of the Society

Bill Arnold and Yan Borodovsky
SPIE President Bill Arnold and SPIE Fellow Yan Borodovsky

Bill Arnold and Alain Diebold
SPIE President Bill Arnold and SPIE Fellow Alain Diebold

Bill Arnold and Kafai Lai
SPIE President Bill Arnold and SPIE Fellow Kafai Lai

 Bill Arnold and Kafai Lai
SPIE President Bill Arnold and SPIE Fellow Bryan Rice

Martin Richardson and Bill Arnold
SPIE Fellow Martin Richardson and SPIE President Bill Arnold

 


Best Paper awards

 

Grant Willson Award
Hidetami Yaegashi
, Kenichi Oyama, Arisa Hara, Sakurako Natori, and Shohei Yamauchi (Tokyo Electron) were recognized with the 2012 C. Grant Willson Award for the Best Paper on Advances in Resist Materials and Processing Technology, for their paper "Overview: continuous evolution on double-patterning process" (8325-11). The award was sponsored by IBM Corp. From left above, conference chair Mark Somervell (Tokyo Electron America) presents the award to authors Yaegashi and Oyama.

 

 Hiroshi Ito Award
Paulina Rincon Delgadillo, Christopher Thode, and Paul Nealey  (Univ. of Wisconsin-Madison); Roel Gronheid (IMEC); Hengpeng Wu and Yi Cao (AZ Electronic Materials USA Corp.); and Mark Somervell and Kathleen Nafus (Tokyo Electron America) were recognized with the 2012 Hiroshi Ito Memorial Award for the Best Student Paper on Advances in Resist Materials and Processing Technology, for their paper "All track directed self-assembly of block copolymers: process flow and origin of defects " (8323-12). The award was sponsored by IBM Corp. From left are conference chair Somervell, Delgadillo, Gronheid, and Nealey.

 

Geniece Hallett-Tapley, Tse-Luen Wee, and  Juan Scaiano (Univ. of Ottawa); Joby Eldo and Edward Jackson (SAFC Hitech); and James Blackwell (Intel Corp.) were recognized with the 2012 Jeffrey Byers Memorial for the Best Poster Award on Advances in Resist Materials and Processing Technology, for their paper "Ionic carbamate photoacid/photobase generators for the advancement of dual-tone photolithography" (8325-68). The award was sponsored by Tokyo Electron.

 

Diana Nyyssonen Award
The Diana Nyyssonen Memorial Award for the Best Paper at SPIE conference Metrology, Inspection, and Process Control for Microlithography XXVI was presented for the paper 8324-55 "Bridging CD metrology gaps of advanced patterning with assistance of nanomolding," authored by Narender Rana and Dario Goldfarb, IBM Corp. Above, from left, at the award presentation are the Metrology, Inspection, and Process Control for Microlithography conference co-chair Jason Cain (Advanced Micro Devices, Inc.), author Rana, and the conference chair Alexander Starikov (I & I Consulting). The Diana Nyyssonen Memorial Award is sponsored by Hitachi High Technologies America.

 


Alexander Starikov and Raja Muthinti
The Best Student Paper Award was established at the Metrology, Inspection, and Process Control for Microlithography conference under KLA-Tencor sponsorship. A panel of judges composed of metrology program committee members and volunteers from the National Institute of Standards and Technology selected the winner, Gangadhara Raja Muthinti of the University at Albany, for his paper 8681-21 "Mueller-based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties," co-authored with Manasa Medikonda, Univ. at Albany; Jody Fronheiser, Vimal Kamineni, GLOBALFOUNDRIES; Brennan Peterson, Joseph Race, Nanometrics; and Alain Diebold, Univ. at Albany.
Above, Metrology conference chair Alexander Starikov (left) presents the SPIE award citation and "check in the mail" to the winning student author Raja Muthinti.
Below, KLA-Tencor CMO Brian Trafas (left) speaks at the inauguration of the Best Student Paper Award for the Metrology conference and congratulates the first student winner, Raja Muthinti, presenting an award trophy to commemorate the occasion.
Brian Trafas and Raja Muthinti

 

Will Conley and Viviana Agudelo
Above, conference chair Will Conley of Cymer presents Viviana Agudelo of Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (IISB) with the 2013 Best Student Paper Award in Optical Microlithography for paper 8683-42 "Application of artificial neural networks to compact mask models in optical lithography simulation." Co-authors are Tim Fühner, Andreas Erdmann, and Peter Evanschitzky of IISB. The award is sponsored by Cymer.

 


Coffee ... and networking!

Advanced Lithography networking

Advanced Lithography networking

Advanced Lithography networking

networking at Advanced Lithography

networking at Advanced Lithography

networking at Advanced Lithography

 SPIE Marketplace

SPIE Marketplace