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    EMLC 2013 Submission & Chair Review System


    29th European Mask and Lithography Conference (EMLC 2013)
    Dates: 22-27 June 2013
    Location: Dresden, Germany


    Paper submissions will go through the SPIE Paper Submission and Review System.

    Submit Your Abstract

    Please submit your abstract to:

    EMLC 2013

    Note: An SPIE account is required to submit an abstract.

    Due Date: 
    Deadline for Abstract Submission: 19 April 2013

    Manage Your Active Submissions
    Complete your submission, submit a revision, or view the status of your abstract.

    Chairs and Committe Members: Access and review abstracts.

    For assistance, please contact Jenny Woods, SPIE Proceedings Coordinator,, or call +1 360 676 3290. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.