Carl Zeiss Microscopy is introducing ORION NanoFab. It is the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology. As a major enhancement to the existing helium ion microscope, ORION NanoFab also utilizes neon ions. The system is therefore capable of providing a complete sub-10 nanometer nanofabrication and sub-nanometer imaging solution for industry, government, and academic research laboratories. An optional gallium focused ion beam (FIB) column can also be integrated.
The neon ion beam offers precise machining and nanofabrication capabilities due to higher sputter yields in ion beam milling and faster resist exposure in ion beam lithography. The helium ion beam allows sub-10 nm nanofabrication as well as high resolution imaging capability in the same instrument. The optional state-of-the-art gallium FIB column allows massive material removal.