San Jose Marriott and San Jose Convention Center
    San Jose, California, United States
    26 February - 2 March 2017
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    Call for Papers now open | EUV, Optical, Resists, Patterning, Metrology, Imprint

    Call for Papers | SPIE Advanced Lithography. Click to learn more about the topic areas

    Abstracts are due 10 September 2012

    Submit your abstract and participate in the industry's premiere event.
    Call for papers | online, PDF
    Papers are solicited in these technical areas:
     • Advanced Etch Technology for Nanopatterning
     • Extreme Ultraviolet (EUV) Lithography
     • Alternative Lithographic Technologies
     • Metrology, Inspection, and Process Control for Microlithography
     • Advances in Resist Materials and Processing Technology
     • Optical Microlithography
     • Design for Manufacturability through Design-Process Integration

    SPIE.TV: The latest advances in lithography | Watch

    Why authors present their work at SPIE Advanced Lithography:
    “For anyone working in lithography it is exactly the correct audience.”
    “The most important symposium on lithography.”
    “Best forum to gain attention from industry decision-makers.”

    Submit your abstract today

     

    The Advanced Lithography Exhibition
    The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. For 35 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.

    Learn more on the Exhibition website

    A look back at Advanced Lithography 2012
    Read news, and see photos
    Final Program (PDF)
    Technical Abstracts (PDF)
    Exhitibition Guide (PDF)
    2012 plenary speakers

    Jim Clifford
    Vice President and GM, CDMA Technologies (USA)The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography

    C. Grant Willson
    Professor of Chemical Engineering, University of Texas at Austin (USA)
    High-Resolution Patterning: A View of the Future

    Christopher J. Progler
    Chief Technology Officer, Photronics Inc. (USA)Squares Do Not Make Good Frisbees

    Advanced Lithography 2012 from SPIE.TV

    Sponsor

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    Important Dates

    Abstracts Due
    Late submissions will be considered. Please submit as soon as possible online.

    Author Notification
    24 October 2016

    Manuscripts Due
    30 January 2017


    Canon


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