Call for papers opens in May
SPIE Advanced Lithography is the world's premier semiconductor lithography conference and exhibition. The 2013 event is scheduled for 24-28 February, in San Jose, California.
SPIE.TV: The latest advances in lithography | Watch In the business? Take part in the Advanced Lithography Exhibition, a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.
More than 600 presentations highlighted the latest research
Jim CliffordVice President and GM, CDMA Technologies (USA)
The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography
C. Grant WillsonProfessor of Chemical Engineering, University of Texas at Austin (USA)
High-Resolution Patterning: A View of the Future
Christopher J. ProglerChief Technology Officer, Photronics Inc. (USA)
Squares Do Not Make Good Frisbees
Abstracts DueLate submissions may be considered. Please send your submission to Pat Wight, SPIE Conference Program Coordinator.
Author Notification24 October 2016
Manuscripts Due30 January 2017
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