SPIE Advanced Lithography

Abstracts are due 10 September 2012
Submit your abstract and participate in the industry's premiere event.

Call for papers | online, PDF

Papers are solicited in these technical areas:
•	Advanced Etch Technology for Nanopatterning
•	Extreme Ultraviolet (EUV) Lithography
•	Alternative Lithographic Technologies
•	Metrology, Inspection, and Process Control for Microlithography
•	Advances in Resist Materials and Processing Technology
•	Optical Microlithography
•	Design for Manufacturability through Design-Process Integration

SPIE.TV: The latest advances in lithography | Watch

Why authors present their work at SPIE Advanced Lithography:

•	“For anyone working in lithography it is exactly the correct audience.”
•	“The most important symposium on lithography.”
•	“Best forum to gain attention from industry decision-makers.”

The Advanced Lithography Exhibition
The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. For 35 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.
Learn more on the Exhibition website

A look back at Advanced Lithography 2012
Read news, and see photos
Final Program (PDF)
Technical Abstracts (PDF)
Exhitibition Guide (PDF)

2012 plenary speakers
Jim Clifford Vice President and GM, CDMA Technologies (USA)The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography
C. Grant Willson Professor of Chemical Engineering, University of Texas at Austin (USA) High-Resolution Patterning: A View of the Future
Christopher J. Progler Chief Technology Officer, Photronics Inc. (USA)Squares Do Not Make Good Frisbees

Advanced Lithography 2012 from SPIE.TV

Call for Papers now open | EUV, Optical, Resists, Patterning, Metrology, Imprint