San Jose Marriott and San Jose Convention Center
    San Jose, California, United States
    26 February - 2 March 2017
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    Call for Papers now open | EUV, Optical, Resists, Patterning, Metrology, Imprint

    Call for Papers | SPIE Advanced Lithography. Click to learn more about the topic areas

    Call for papers opens in May

    SPIE Advanced Lithography is the world's premier semiconductor lithography conference and exhibition. The 2013 event is scheduled for 24-28 February, in San Jose, California.


    SPIE.TV: The latest advances in lithography | Watch


    In the business? Take part in the Advanced Lithography Exhibition, a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.



    A look back at Advanced Lithography 2012
    This year's event ended Thursday 16 February after a five-day run in San Jose.
    Read news, and see photos
    Final Program (PDF)
    Technical Abstracts
    Exhitibition Guide (PDF)

    More than 600 presentations highlighted the latest research

    Advanced Etch Technology for Nanopatterning
    Extreme Ultraviolet (EUV) Lithography
    Alternative Lithographic Technologies
    Metrology, Inspection, and Process Control for Microlithography
    Advances in Resist Materials and Processing Technology
    Optical Microlithography
    Design for Manufacturability through Design-Process Integration
    2012 plenary speakers

    Jim Clifford

    Vice President and GM, CDMA Technologies (USA)

    The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography

    C. Grant Willson

    Professor of Chemical Engineering, University of Texas at Austin (USA)

    High-Resolution Patterning: A View of the Future

    Christopher J. Progler

    Chief Technology Officer, Photronics Inc. (USA)

    Squares Do Not Make Good Frisbees


    Advanced Lithography 2012 from SPIE.TV

    Sponsor

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    Important Dates

    Abstracts Due
    Late submissions may be considered. Please send your submission to Pat Wight, SPIE Conference Program Coordinator.

    Author Notification
    24 October 2016

    Manuscripts Due
    30 January 2017


    Canon


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