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Journal of Micro/Nanolithography, MEMS, and MOEMS

Chris A. Mack, Lithoguru.com
Editor-in-Chief

Editorial Board

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries. The wide range of such devices also includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Scope

Lithography: tools, materials, and processes associated with the patterning of structures that have submicrometer and nanometer-scale features. Included are imaging and nonimaging approaches using optics, electron and other particle beams, nanoimprint, molecular self-assembly, and their hybrids. Applications include semiconductor fabrication, but also patterning for other micro/nanodevices.

Microelectromechanical systems (MEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain both electrical and mechanical elements.

Micro-optoelectromechanical systems (MOEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain electrical, mechanical, and optical elements (that is, the merging of micro-optics and MEMS).

Microfabrication: technologies to shape three-dimensional structures leading to the fabrication of active and passive electronics, photonics, MEMS, MOEMS, micro/nano-optics, and other micro/nanodevices.

Metrology: metrology and process control for the above devices and their fabrication processes.

If you are interested in submitting a manuscript to the Journal of Micro/Nanolithography, MEMS, and MOEMS, please read our guidelines for authors.

Special Section Calls for Papers


JM3 Video Intro Introduction to the Journal of Micro/Nanolithography, MEMS, and MOEMS from the Editor-in-Chief, Chris Mack.

Abstracting and Indexing

  • Science Citation Index Expanded
  • Materials Science Citation Index
  • Current Contents - Physical, Chemical & Earth Sciences
  • Current Contents - Engineering, Computing & Technology
  • Inspec
  • Scopus
  • Ei Compendex
  • Chemical Abstracts
  • Astrophysics Data System

Editorial Office

Contact the JM3 staff at:

SPIE
P.O. Box 10
Bellingham, WA 98227-0010 USA
tel: +1 360 676 3290
fax: +1 360 647 1445
journals@spie.org


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JM3 Author Information
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Calls for Papers
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Additional Information

Editorial Board
Reviewer Information
Terms of Use
Mailing Schedule and Claims
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JM3 Facts and Figures

ISSN: 1932-5150
E-ISSN: 1932-5134
Publisher: SPIE
Frequency: Quarterly (4 issue/year)
Format: Print and Online
Impact Factor: 1.205
5-Year Impact Factor: 1.008 
Subject Category Rankings: 46th out of 82 journals in Optics; 57th out of 73 journals in Nanoscience & Nanotechnology; 127th out of 247 journals in Electrical & Electronic Engineering; 144th out of 251 journals in Multidisciplinary Materials Science
h5-index: 19