Chris A. Mack, Lithoguru.com
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries. The wide range of such devices also includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
View full journal scope
Lithography: tools, materials, and processes associated with the patterning of structures that have submicrometer and nanometer-scale features. Included are imaging and nonimaging approaches using optics, electron and other particle beams, nanoimprint, molecular self-assembly, and their hybrids. Applications include semiconductor fabrication, but also patterning for other micro/nanodevices.
Microelectromechanical systems (MEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain both electrical and mechanical elements.
Micro-optoelectromechanical systems (MOEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain electrical, mechanical, and optical elements (that is, the merging of micro-optics and MEMS).
Microfabrication: technologies to shape three-dimensional structures leading to the fabrication of active and passive electronics, photonics, MEMS, MOEMS, micro/nano-optics, and other micro/nanodevices.
Metrology: metrology and process control for the above devices and their fabrication processes.
||Introduction to the Journal of Micro/Nanolithography, MEMS, and MOEMS from the Editor-in-Chief, Chris Mack.
Special Section Calls for Papers
Facts and Figures
Frequency: Quarterly (4 issue/year)
Format: Print and Online
Impact Factor: 1.205*
5-Year Impact Factor: 1.008*
Subject Category Rankings: 46th out of 82 journals in Optics; 57th out of 73 journals in Nanoscience & Nanotechnology; 127th out of 247 journals in Electrical & Electronic Engineering; 144th out of 251 journals in Multidisciplinary Materials Science*
* 2014 Release of Journal Citation Reports with "Source: 2013 Web of Science data." Journal Citation Reports is a registered trademark of Thomson Reuters. All rights reserved.
† h5-index is the h-index for articles published in the last 5 complete years. It is the largest number h such that h articles published in 2009-2013 have at least h citations each (from Google Scholar)
Abstracting and Indexing
- Science Citation Index Expanded
- Materials Science Citation Index
- Current Contents - Physical, Chemical & Earth Sciences
- Current Contents - Engineering, Computing & Technology
- Ei Compendex
- Chemical Abstracts
- Astrophysics Data System
Contact the JM3 staff at:
P.O. Box 10
Bellingham, WA 98227-0010 USA
tel: +1 360 676 3290
fax: +1 360 647 1445