Journal of Micro/Nanolithography, MEMS, and MOEMS

Chris A. Mack, Lithoguru.com
Editor-in-Chief

Editorial Board

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM³) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microeletromechanical systems, micro-optoelectromechanical systems, and photonics industries. The wide range of such devices also includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Topical areas covered include:

Lithography: tools, materials, and processes associated with the patterning of structures that have submicrometer and nanometer-scale features. Included are imaging and nonimaging approaches using optics, electron and other particle beams, nanoimprint, molecular self-assembly, and their hybrids. Applications include semiconductor fabrication, but also patterning for other micro/nanodevices.

Microelectromechanical systems (MEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain both electrical and mechanical elements.

Micro-optoelectromechanical systems (MOEMS): the design, fabrication, operation, reliability, and testing of microdevices that contain electrical, mechanical, and optical elements (that is, the merging of micro-optics and MEMS).

Microfabrication: technologies to shape three-dimensional structures leading to the fabrication of active and passive electronics, photonics, MEMS, MOEMS, micro/nano-optics, and other micro/nanodevices.

Metrology: metrology and process control for the above devices and their fabrication processes.

Introduction to the Journal of Micro/Nanolithography, MEMS, and MOEMS from the Editor-in-Chief, Chris Mack.

Karolyn S. Labes, Managing Editor
SPIE
tel: +1 360 676 3290
journals@spie.org

Facts and Figures

ISSN: 1932-5150
E-ISSN: 1932-5134
Publisher: SPIE
Frequency: Quarterly (4 issue/year)
Format: Print and Online
Impact Factor: 0.995*
5-Year Impact Factor: 1.009*
Subject Category Rankings: 48^th out of 79 journals in Optics; 52^nd out of 66 journals in Nanoscience & Nanotechnology; 126^th out of 245 journals in Electrical & Electronic Engineering; 132^nd out of 232 journals in Multidisciplinary Materials Science*
h5-index^†: 15

^{* From the 2011 Science Edition of Thomson Reuters' Journal Citation Report®
† h5-index is the h-index for articles published in the last 5 complete years. It is the largest number h such that h articles published in 2007-2011 have at least h citations each (from Google Scholar)}

Abstracting and Indexing

• Science Citation Index Expanded
• Materials Science Citation Index
• Current Contents - Physical, Chemical & Earth Sciences
• Current Contents - Engineering, Computing & Technology
• Inspec
• Scopus
• Ei Compendex
• Chemical Abstracts
• Astrophysics Data System