Chris A. Mack, Lithoguru.com
Editor-in-Chief
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Topical areas covered include: tools, processes, and materials associated with the lithography of structures that have submicrometer features; technologies to shape three-dimensional structures leading to the fabrication of active and passive electronic, electromechanical, optoelectronic, and opto-electro-mechanical devices, as well as passive optical devices; and core processes and technologies necessary for packaging and integration, with a focus on wafer-scale and other volume integration methods.
Chris A. Mack, Editor-in-Chief
Lithoguru.com
tel: 512 514 6225
chris@lithoguru.com
Karolyn S. Labes, Managing Editor
SPIE
tel: +1 360 676 3290
journals@spie.org
Facts and Figures
Impact Factor: 1.194*
5-Year Impact Factor: 1.211*
Subject Category Rankings: 36th out of 78 journals in Optics; 46th out of 63 journals in Nanoscience & Nanotechnology; 104th out of 222 journals in Multidisciplinary Materials Science; 103rd out of 247 journals in Electrical & Electronic Engineering*
ISSN: 1932-5150
E-ISSN: 1932-5134
Publisher: SPIE
Frequency: Quarterly (4 issue/year)
Format: Print and Online
*From the 2010 Science Edition of Thomson Reuters' Journal Citation Report®
Abstracting and Indexing
JM3 is abstracted and indexed in leading scientific databases, including:
- Science Citation Index Expanded
- Materials Science Citation Index
- Current Contents/Physical, Chemical & Earth Science
- Current Contents/Engineering, Computing & Technology
- Inspec
- Scopus
- Ei Compendex
- Chemical Abstracts
