The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) is a print and online journal that publishes papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries.
In addition to contributed research papers, JM3 occasionally publishes special sections in key areas of technology. Special sections are assembled by guest editors. See the editorial schedule for a list of forthcoming special section topics and dates.
Guidelines for Authors
Authors should read the General Guidelines and Policies for Journal Authors for details about journal policies, manuscript preparation, submission, and publication in SPIE journals.
Types of Manuscripts
Letter: A short technical communication of significant interest intended for rapid publication in the Letters section of the journal. The manuscript length may not exceed three printed journal pages. This corresponds to approximately 3000 words (excluding title, abstract, and author information); figures will further reduce the maximum word content. A page length template can help determine final typeset page length. A page length estimator is available.
A Letters page length template (.doc) is available for your convenience. Please note that this template should not be used for layout and formatting of your manuscript. It should only be used to roughly determine the final length of a typeset paper. To use this template, copy and paste the text of your abstract, paper body, and references where shown, and do not change font or margins. Insert and size your figures and captions to determine if the paper will fit within the three-page limit. For manuscript formatting templates, please refer to the instructions in the General Guidelines for Authors.
Regular Paper: A full-length manuscript presenting original work intended as a regular contribution to the journal.
Special Section Paper: A full-length manuscript presenting original work intended for submission to a special topical section organized by a guest editor.
Why publish in this journal?
The scope of JM3 is broad to facilitate synergy and interest between the communities served by the journal. JM3 is abstracted in leading scientific databases and provides rapid online publication and timely delivery of research. JM3 is published online as part of the SPIE Digital Library, accessible by researchers at many of the world's leading universities, laboratories, and corporations as well as thousands of individual subscribers.
- Online-first publication of articles
- Professional copyediting and typesetting
- Rigorous peer review
- Free online color figures
- Multimedia integration
- 5 free downloads for authors from the SPIE Digital Library
- Open access publication at a low cost
- Voluntary page charges
- Abstracting and indexing in leading scientific databases, including Science Citation Index Expanded; Materials Science Citation Index; Current Contents/Physical, Chemical & Earth Science; Current Contents/Engineering, Computing & Technology; Inspec; Scopus; Ei Compendex; and Chemical Abstracts.
Payment of page charges for JM3 is voluntary, at $100 per typeset page. Page charge support helps SPIE as a not-for-profit society to offset the costs involved in the publication of research results, including copyediting, typesetting, and xml conversion. SPIE journal page charges are kept low in recognition of the fact that many authors have limited funding available to cover publication expenses. Authors who pay the voluntary page charges in full receive the benefit of open access for their paper. Open access papers are also published under a Creative Commons CC-BY license. Read more about our open access program.
An author's decision on whether to pay page charges has no impact on the review process or the timing of publication of the article. Articles for which publication fees are not paid in full are published under subscription access control with the standard SPIE transfer of copyright agreement. Read more about the rights and restrictions of these publication licenses.
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SPIE uses the CrossCheck plagiarism screening service to detect instances of overlapping and similar text in submitted manuscripts. CrossCheck is a multipublisher initiative to screen published and submitted content for originality.